Shower plate for plasma processing apparatus and plasma processing apparatus

• US 20050258280A1
• Filed: 05/02/2005
• Published: 11/24/2005
• Est. Priority Date: 05/24/2004
• Status: Abandoned Application

• Current Assignee: Shin-Etsu Chemical Company Limited
• Original Assignee: Shin-Etsu Chemical Company Limited
• Inventors: Goto, Keiichi, Kawai, Makoto, Satoh, Kenji
• Application Number:
  US11/118,373
• Publication Number:
  US 20050258280A1
• Time in Patent Office: Days
• US Class Current: 239/548
• CPC Class Codes: B05B 1/185 characterised by their outlet element; Mounting arrangements therefor
• CPC Class Codes: C23C 8/36 using ionised gases, e.g. ionitriding
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01L 21/3065 Plasma etching; Reactive-ion etching

Abstract

There is disclosed a shower plate 1, wherein the shower plate has a plurality of holes 3 for inserting the head of the fastening member and holes 4 for fitting the head are formed integrally along a concentric circle in the outside region of the gas feeding holes 2 on a side facing the supporting member, each hole for fitting extending in one direction of the concentric circle from each hole for insertion, each hole for fitting has a groove portion 4b through which the shank of the fastening member is to pass and a fitting portion 4a which is wider than the groove portion and in which the head of the fastening member is to be fitted, and the head of the fastening member fixed in the supporting member is inserted into the hole for insertion of the shower plate and the shower plate is turned so that the head of the fastening member is fitted in the fitting portion, and thereby the shower plate is supported by the supporting member without exposure of the fastening member. There can be provided a shower plate for a plasma processing apparatus, wherein effective diameter is large enough, contamination of a substrate to be treated can be prevented, it is easy to manufacture, and it is easy to fix to a supporting member.

Claims

1. A shower plate to be supported through fastening member whose a diameter of head is larger than that of its shank by a supporting member positioned opposite a substrate to be treated in a plasma processing apparatus,

wherein the shower plate has through-holes for feeding gas,

a plurality of holes for inserting the head of the fastening member and holes for fitting the head are formed integrally along a concentric circle in the outside region of the gas feeding holes on a side facing the supporting member, each hole for fitting extending in one direction of the concentric circle from each hole for insertion,

each hole for fitting has a groove portion through which the shank of the fastening member is to pass and a fitting portion which is wider than the groove portion and in which the head of the fastening member is to be fitted, and

the head of the fastening member fixed in the supporting member is inserted into the hole for insertion of the shower plate and the shower plate is turned so that the head of the fastening member is fitted in the fitting portion, and thereby the shower plate is supported by the supporting member without exposure of the fastening member.

2. The shower plate according to claim 1, the width of the fitting portion is formed larger than that of the groove portion by the range of 1-20 mm.

3. The shower plate according to claim 1, its diameter is in the range of 300-500 mm, and its thickness is in the range of 5-30 mm.

4. The shower plate according to claim 2, its diameter is in the range of 300-500 mm, and its thickness is in the range of 5-30 mm.

5. A plasma processing apparatus being provided with the shower plate according to claim 1.

6. A plasma processing apparatus being provided with the shower plate according to claim 2.

7. A plasma processing apparatus being provided with the shower plate according to claim 3.

8. A plasma processing apparatus being provided with the shower plate according to claim 4.