Microfabricated miniature grids
First Claim
Patent Images
1. An integrated microfabricated grid for controlling a charged particle stream, the grid formed of a plurality of electrically isolated conductive elements, comprising:
- a substrate to serve as a support for said conductive elements at one of an end thereof, or at another support location within the grid;
a hole in the substrate to allow the charged particle stream to pass therethrough; and
the conductive elements lying in a common plane with one another, and formed from a microfabricated, integral layer disposed adjacent the substrate, the conductive elements having at least one dimension of 10 micrometers (um) or less.
2 Assignments
0 Petitions
Accused Products
Abstract
A grid structure and method for manufacturing the same. The grid is used for gating a stream of charged particles in certain types of particle measurement instruments, such as ion mobility spectrometers and the like. The methods include various microfabrication techniques for etching and/or depositing grid structure materials on a silicon substrate.
-
Citations
40 Claims
-
1. An integrated microfabricated grid for controlling a charged particle stream, the grid formed of a plurality of electrically isolated conductive elements, comprising:
-
a substrate to serve as a support for said conductive elements at one of an end thereof, or at another support location within the grid;
a hole in the substrate to allow the charged particle stream to pass therethrough; and
the conductive elements lying in a common plane with one another, and formed from a microfabricated, integral layer disposed adjacent the substrate, the conductive elements having at least one dimension of 10 micrometers (um) or less. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A method of fabricating a micromachined grid for gating a beam of charged particles, comprising the steps of:
-
a) selecting a multilayered material consisting of a conductive layer bonded to an insulating layer;
b) patterning a photoresist onto the conductive layer to define a set of conductive elements;
c) micromachining the conductive layer to isolate the set of conductive elements;
d) patterning a photoresist onto the insulating layer to define a region where charged particles may pass through the grid; and
e) micromachining the substrate to open a hole through the grid while providing mechanical support to the ends of the conductive elements. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
-
-
29. A method of fabricating a unipotential grid for defining potential gradients in a charged particle optical system, comprising the steps of:
-
a) patterning a photoresist onto a semiconductive material layer;
b) micromachining the semiconductive material layer to define a width, depth and spacing of a set of conductive elements that comprise the grid - View Dependent Claims (30, 31, 32, 33, 34, 35)
-
-
36. A method for fabricating a micromachined grid for gating a beam of charge particles, comprising the steps of:
-
a) patterning a photoresist to define areas on the substrate to be used for conductive elements;
b) adding material to the defined areas on the substrate to produce a set of conductive elements that comprise the grid;
c) removing the photo resist material; and
d) micromachining the substrate to open a hole through the grid. - View Dependent Claims (37, 38, 39, 40)
-
Specification