System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
First Claim
1. A system comprising:
- a first module including a set of pattern generating devices;
a second module including a set of magnification changing devices;
a third module including a set of illuminating devices; and
a fourth module including a set of projection optical devices.
7 Assignments
0 Petitions
Accused Products
Abstract
A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.
-
Citations
27 Claims
-
1. A system comprising:
-
a first module including a set of pattern generating devices;
a second module including a set of magnification changing devices;
a third module including a set of illuminating devices; and
a fourth module including a set of projection optical devices. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
-
-
19. A system comprising:
-
a set of pattern generators; and
a set of magnification changing devices having a same number of magnification changing devices as pattern generators in the set of pattern generators, wherein a characteristic of each of the pattern generators is used to chose which of the magnification changing devices is aligned with one of the pattern generators. - View Dependent Claims (20, 21, 22, 23, 24)
-
-
25. A system comprising:
-
means for pattering light that forms multiple columns of patterned light from light received from an illumination system;
means for changing magnification that changes magnification in each of the columns of patterned light; and
means for patterning a substrate by directing the columns of pattered light onto exposure areas on the substrate. - View Dependent Claims (26, 27)
-
Specification