System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions

• US 20050264782A1
• Filed: 05/26/2004
• Published: 12/01/2005
• Est. Priority Date: 05/26/2004
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Vladimirsky, Yuli, Ryzhikov, Lev, Sakin, Lev
• Granted Patent: US 7,242,456 B2
• Time in Patent Office: Days
• US Class Current: 355/55
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

Claims

1. A system comprising:

a first module including a set of pattern generating devices;

a second module including a set of magnification changing devices;

a third module including a set of illuminating devices; and

a fourth module including a set of projection optical devices.

2. The system of claim 1, wherein at least one of the sets comprises more than one of the respective devices.

3. The system of claim 1, wherein at least two of the modules have a same number of respective devices.

4. The system of claim 3, wherein characteristics of the set of magnification changing devices corresponds to characteristics of the set of pattern generating devices.

5. The system of claim 1, wherein the set of pattern generating devices comprises at least one of reticles, spatial light modulators, contrast devices, grating light valves, digital mirror devices, and liquid crystal display devices.

6. The system of claim 1, wherein the set of magnification changing devices comprises one or more optical devices.

7. The system of claim 6, wherein the one or more optical devices comprise lenses.

8. The system of claim 1, wherein light beams travel through a plurality of light channels in respective ones of the sets of devices.

9. The system of claim 1, wherein characteristics of the set of pattern generating devices and the set of magnification changing devices correspond to a desired resolution of a pattern generated by the set of pattern generating devices.

10. The system of claim 1, wherein the first and second modules are combined into a single module.

11. The system of claim 1, wherein the set of illumination devices comprises:

at least one illumination optical system; and

at least one beam splitter.

12. The system of claim 1, further comprising:

a substrate that receives exposure light beams from the fourth module, wherein an entire surface of the substrate receives the exposure light beams at substantially a same time.

13. The system of claim 1, further comprising:

a detector that detects characteristics of the first module and that produces a result signal therefrom; and

a controller that uses the result signal to control alignment of the second module with respect to the first module.

14. The system of claim 1, wherein the third module receives a beam of radiation from a radiation source.

15. The system of claim 1, wherein the third module receives a beam of radiation from a plurality of radiation sources.

16. The system of claim 1, wherein the third module receives a plurality of beams of radiation from a first end of a light divider that receives radiation from a radiation source at a second end of the light divider.

17. The system of claim 16, wherein the light divider comprises a single-in-multiple-out waveguide.

18. The system of claim 16, wherein the divider comprises a set of optical elements.

19. A system comprising:

a set of pattern generators; and

a set of magnification changing devices having a same number of magnification changing devices as pattern generators in the set of pattern generators,

wherein a characteristic of each of the pattern generators is used to chose which of the magnification changing devices is aligned with one of the pattern generators.

20. The system of claim 19, wherein the set of pattern generators comprises one of static pattern generators and dynamic pattern generators.

21. The system of claim 20, wherein the static pattern generators comprise one of reticles, masks, and photomasks.

22. The system of claim 20, wherein the dynamic pattern generators comprise one of digital mirror devices, liquid crystal displays, and grating light valves.

23. The system of claim 19, wherein the magnification changing devices comprise one or more optical devices.

24. The system of claim 23, wherein the one or more optical devices comprises lenses.

25. A system comprising:

means for pattering light that forms multiple columns of patterned light from light received from an illumination system;

means for changing magnification that changes magnification in each of the columns of patterned light; and

means for patterning a substrate by directing the columns of pattered light onto exposure areas on the substrate.

26. The system of claim 25, wherein the means for patterning a substrate patterns an entire surface of the substrate at substantially a same time.

27. The system of claim 25, further comprising:

an alignment means that aligns the first and second modules after determining characteristics of the first module.