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Lithographic apparatus and device manufacturing method

  • US 20050264790A1
  • Filed: 06/01/2004
  • Published: 12/01/2005
  • Est. Priority Date: 06/01/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illumination system to condition a projection beam of radiation;

    a support structure to support a patterning device, the patterning device constructed to impart the projection beam with a pattern in its cross-section;

    a substrate table to hold a substrate; and

    a projection system to project the patterned beam onto a target portion of the substrate;

    wherein the patterning device has a critical dimension whose value varies with position across the patterning device, the apparatus further comprising a controller, configured and arranged to vary a radiation dose applied to the target portion according to a position on the target portion so as to compensate for the variation of CD across the patterning device.

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