Method and apparatus for depositing material onto a surface

• US 20050266149A1
• Filed: 04/29/2005
• Published: 12/01/2005
• Est. Priority Date: 04/30/2004
• Status: Active Grant

• Current Assignee: BioForce Nanosciences, Inc.
• Original Assignee: BioForce Nanosciences, Inc.
• Inventors: Xu, Juntao, Henderson, Eric R., Mosher, Curtis L., Huff, Janice Lillian, Lynch, Michael P., Nettikadan, Saju Rappai
• Granted Patent: US 7,690,325 B2
• Time in Patent Office: Days
• US Class Current: 427/2.110
• CPC Class Codes: B01J 2219/00387 Applications using probes
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01L 2200/12 Specific details about manufacturing devices
• CPC Class Codes: B01L 2200/143 Quality control, feedback systems
• CPC Class Codes: B01L 2300/0816 Cards, e.g. flat sample carriers usually with flow in two horizontal directions
• CPC Class Codes: B01L 2300/0838 Capillaries
• CPC Class Codes: B01L 2300/10 Means to control humidity and/or other gases
• CPC Class Codes: B01L 2400/02 Drop detachment mechanisms of single droplets from nozzles or pins
• CPC Class Codes: B01L 2400/0406 capillary forces
• CPC Class Codes: B01L 3/0244 using pins
• CPC Class Codes: B01L 3/0248 Prongs, quill pen type dispenser

Abstract

Some embodiments of the present invention provide an apparatus and method in which material is deposited upon a surface from an elongated beam having an aperture defined therein through which the material is moved by passive adsorption. The elongated beam can be substantially planar along substantially its entire length, can be oriented at an acute angle with respect to the surface during deposition processes, and can have a length no greater than about 2 mm. In some embodiments, the aperture can be elongated, can extend from a material reservoir to a location short of the terminal end of the elongated beam or through the terminal end of the elongated beam, and can have a portion extending through the thickness of the elongated beam.

Claims

1. An apparatus for depositing material onto a surface, the apparatus comprising:

a base;

a substantially planar elongated beam having a proximal portion extending from the base and a distal portion located a distance from the proximal portion such that the elongated beam forms a cantilever with respect to the base, the elongated beam having a length of no greater than about 2 mm; and

an elongated aperture defined in the elongated beam, the elongated aperture at least partially defining an inner surface dimensioned to move liquid along the elongated aperture by passive adsorption, the elongated aperture having a distal portion from which material is deposited onto the surface.

2. The apparatus of claim 1, wherein the length of the elongated beam is no less than about 100 nm and is no greater than about 1 mm.

3. The apparatus of claim 1, further comprising a reservoir in fluid communication with a proximal portion of the elongated aperture, the reservoir adapted to retain the material to be deposited.

4. The apparatus of claim 3, wherein the reservoir is wider than the elongated beam and is positioned in the base.

5. The apparatus of claim 1, wherein at least a portion of the elongated aperture is tapered in width along at least a portion of the elongated aperture.

6. The apparatus of claim 1, wherein the elongated aperture extends to and terminates at a location disposed a distance from a terminal end of the elongated beam.

7. The apparatus of claim 1, wherein the elongated aperture extends to and through a terminal end of the elongated beam.

8. The apparatus of claim 1, wherein:

the elongated beam includes an upper surface and a lower surface; and

the upper surface and the lower surface are substantially parallel, flat, and planar along the length of the elongated beam.

9. The apparatus of claim 1, wherein the elongated beam is one of a plurality of elongated beams extending from the base to facilitate simultaneous deposition of at least one material onto the surface.

10. The apparatus of claim 1, wherein:

the elongated beam has a thickness,

the elongated aperture includes a first portion having a depth less than the thickness of the elongated beam, and

the elongated aperture includes a second portion having a depth equal to about the thickness of the elongated beam.

11. An apparatus for depositing material onto a surface, the apparatus comprising:

a base;

an elongated beam extending from the base in a cantilevered configuration, the elongated beam having

a substantially planar upper surface along substantially its entire length;

a substantially planar lower surface along substantially its entire length;

a proximal portion extending from the base; and

a distal portion located a distance from the proximal portion, the elongated beam oriented at an acute angle with respect to the surface; and

an elongated aperture defined in the elongated beam, the elongated aperture at least partially defining an inner surface adapted to facilitate movement of the material along the elongated aperture by passive adsorption, and a distal portion adapted for at least one of material loading into the elongated beam and material deposition from the elongated beam.

12. The apparatus of claim 11, wherein:

the elongated beam has a thickness; and

at least a portion of the elongated aperture extends through the thickness of the elongated beam.

13. The apparatus of claim 11, wherein at least a portion of the elongated aperture is tapered toward a terminal end of the elongated beam.

14. The apparatus of claim 13, wherein at least a portion of the elongated beam is tapered toward a terminal end of the elongated beam.

15. The apparatus of claim 11, wherein:

the elongated beam has a length no greater than about 2 mm; and

the thickness of the elongated beam is no less than about 2 microns and is no greater than about 3 microns.

16. The apparatus of claim 11, wherein the distal portion of the elongated aperture is no greater than about 1 micron in width.

17. The apparatus of claim 11, wherein the distal portion of the elongated beam and the distal portion of the elongated aperture are shaped to produce a spot having a diameter no less than about 2 microns and no greater than about 3 microns.

18. The apparatus of claim 11, further comprising a reservoir located in the base, in fluid communication with the elongated aperture, and adapted to retain the material.

19. A method for depositing material onto a surface, the method comprising:

providing an elongated beam extending from a base and having a proximal portion adjacent the base and a distal portion located a distance from the proximal portion, the elongated beam being substantially planar along its length;

moving the material along an elongated aperture defined in the elongated beam and toward the distal portion of the elongated beam by passive adsorption, the elongated aperture having a distal portion from which material is deposited onto the surface;

moving the distal portion of the elongated beam toward the surface; and

depositing the material onto the surface at a location no greater than about 2 mm from the base.

20. The method of claim 19, further comprising contacting the surface with the distal portion of the elongated beam.

21. The method of claim 19, further comprising at least one of controlling at least one environmental parameter adjacent the distal portion of the elongated beam and moving the material along the elongated aperture by capillary action.

22. The method of claim 19, further comprising orienting the elongated beam at an acute angle with respect to the surface.

23. The method of claim 19, wherein:

the elongated beam has a thickness; and

moving the material along an elongated aperture includes;

moving the material along a first portion of the elongated aperture having a depth less than the thickness of the elongated beam, and

moving the material along a second portion of the elongated aperture having a depth equal to about the thickness of the elongated beam.

24. The method of claim 19, wherein moving the material along an elongated aperture includes moving the material along a portion of the elongated aperture that tapers in width along the at least a portion of the length of the elongated aperture.

25. The method of claim 19, further comprising moving the material through a terminal end of the elongated beam.

26. A method for depositing material onto a surface, the method comprising:

providing a base;

providing an elongated beam that extends from the base in a cantilevered configuration, the elongated beam being substantially planar along substantially its entire length and having a proximal portion adjacent the base and a distal portion located a distance from the proximal portion;

providing an elongated aperture defined in the elongated beam, the elongated aperture having a distal portion from which material is deposited onto the surface;

orienting the distal portion of the elongated beam at an acute angle with respect to the surface;

moving the material along the elongated aperture toward the distal portion of the elongated aperture by passive adsorption; and

depositing the material from the distal portion of the elongated aperture toward the surface.

27. The method of claim 26, wherein moving the material along the elongated aperture includes moving the material independently of electrical force.

28. The method of claim 26, wherein the material is moved along the elongated aperture at least partially by at least one of:

controlling at least one environmental parameter, and

capillary action.

29. The method of claim 26, wherein depositing the material from the distal portion of the elongated aperture toward the surface includes depositing the material onto the surface at a location no greater than about 2 mm from the base.

30. The method of claim 26, further comprising back-loading the elongated aperture with the material.