Radiation-curable resin composition and cured product thereof
First Claim
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1. A radiation-curable resin composition comprising an inorganic component containing a silica particle composed of a hydrolyzate of an oligomer of an alkoxysilane and a monomer and/or an oligomer thereof, wherein viscosity at 25°
- C. is from 1,000 to 10,000 centipoises.
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Abstract
A radiation-curable resin composition comprising an inorganic component containing a silica particle composed of a hydrolyzate of an oligomer of an alkoxysilane and a monomer and/or an oligomer thereof, wherein viscosity at 25° C. is from 1,000 to 10,000 centipoises.
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Citations
30 Claims
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1. A radiation-curable resin composition comprising an inorganic component containing a silica particle composed of a hydrolyzate of an oligomer of an alkoxysilane and a monomer and/or an oligomer thereof,
wherein viscosity at 25° - C. is from 1,000 to 10,000 centipoises.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 22, 23, 24, 26, 27, 28, 30)
- 12. A radiation-curable resin composition comprising a silica particle composed of a hydrolyzate of an oligomer of an alkoxysilane, a monomer containing a urethane bond or a hydroxyalkylene group and/or an oligomer thereof, and a silane coupling agent.
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17. A radiation-curable resin composition comprising a silica particle and a monomer containing a urethane bond or a hydroxyalkylene group and/or an oligomer thereof,
wherein the monomer and/or the oligomer thereof have an acid group.
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25. A radiation-curable resin composition, wherein a cured product obtainable by irradiation at a radiation intensity of 0.1 to 3 J/cm2 has the following physical properties a) and b):
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a) a surface hardness is HB or higher, and b) after a laminate obtained by forming a cured product layer having a film thickness of 100±
15 μ
m on a substrate material made of polycarbonate having a thickness of 1.2±
0.2 mm is placed under an environment of 80°
C. and 85% RH for 100 hours, it is retained that a ratio of adhered area to the adherent material is 50% of initial adhered area.
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29. An optical recording medium having a protective layer having a surface hardness of HB or higher and a thickness of 20 μ
- m or more,
wherein it is retained that a ratio of adhered area of a substrate or a substrate having a laminate to the protective layer after placed under an environment of 80°
C. and 85% RH for 100 hours is 50% or more of initial adhered area.
- m or more,
Specification