Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
a projection system arranged to project a patterned beam of radiation onto a target portion of the substrate;
a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate; and
a liquid supply system member compensator configured to apply a force to the liquid supply system member to at least partially compensate for an interaction between the liquid supply system member and the substrate table and coupled to a frame that is substantially mechanically isolated from the projection system, the isolated frame capable of supporting at least part of a reaction to a force applied by the liquid supply system member compensator to the liquid supply system member.
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Abstract
An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
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Citations
20 Claims
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1. A lithographic apparatus, comprising:
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a substrate table configured to hold a substrate;
a projection system arranged to project a patterned beam of radiation onto a target portion of the substrate;
a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate; and
a liquid supply system member compensator configured to apply a force to the liquid supply system member to at least partially compensate for an interaction between the liquid supply system member and the substrate table and coupled to a frame that is substantially mechanically isolated from the projection system, the isolated frame capable of supporting at least part of a reaction to a force applied by the liquid supply system member compensator to the liquid supply system member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A lithographic apparatus, comprising:
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a substrate table configured to hold a substrate;
a projection system arranged to project a patterned beam of radiation onto a target portion of the substrate;
a liquid supply system member configured to contain a liquid in a space between the projection system and the substrate; and
a liquid supply system member compensator configured to compensate for a force exerted by the liquid supply system member toward the substrate table. - View Dependent Claims (11, 12, 13)
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14. A device manufacturing method, comprising:
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containing a liquid in a space between a projection system of a lithographic apparatus and a substrate table using a liquid supply system member;
compensating for an interaction between the liquid supply system member and the substrate table by using a liquid supply system member compensator coupled to a frame that is substantially mechanically isolated from the projection system; and
projecting a patterned radiation beam through the liquid onto a target portion of the substrate using the projection system. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification