Lithographic apparatus and device manufacturing method

• US 20050270515A1
• Filed: 06/08/2004
• Published: 12/08/2005
• Est. Priority Date: 06/08/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Troost, Kars Zeger
• Granted Patent: US 7,123,348 B2
• Time in Patent Office: Days
• US Class Current: 355/69
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70383 Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams maskless lithography using a programmable mask G03F7/70291
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Abstract

A system and method to manufacturing a device provide a substrate and perform at least one exposure step. Each exposure step projects a patterned beam of radiation, which was patterned using an individually controllable elements, onto a target portion of the substrate. The projected patterned beam includes a plurality of pixels. Each exposure step also: (a) ordinarily controls the elements, such that each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step; and (b) exceptionally controls the elements, such that at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel. Alternatively, it may compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step. The invention uses doses up to the predetermined normal maximum for normal printing, but reserves at least one increased dose for compensation purposes. Accordingly, even when a dead black pixel falls in the middle of a group of surrounding white pixels it can be compensated for by increasing the radiation dose delivered by one or more of those neighboring white pixels, above the normal fully white value.

Claims

1. A device manufacturing method, comprising:

(a) patterning a projection beam of radiation with an array of individually controllable elements;

(b) projecting the patterned projection beam onto a target portion of a substrate, the projected patterned projection beam comprising a plurality of pixels;

(c) controlling the elements such that each pixel in the plurality of pixels delivers a first radiation dose to the target portion that is below or equal to a predetermined dose; and

(d) controlling the elements such that at least one selected pixel in the plurality of pixels delivers a second radiation dose greater than the predetermined dose to compensate at least partially for at least one of;

(1) an effect of a defective element at a known position in the array of individually controllable elements on a pixel in the plurality of pixels adjacent the selected pixel, and

(2) an underexposure of the target portion at a location corresponding to the selected pixel resulting from exposure of the location to a pixel in the plurality of pixels affected by a known defective element.

2. The method of claim 1, further comprising increasing said second radiation dose to a new dose larger than the predetermined dose by a factor of up to at least about 1.1.

3. The method of claim 1, further comprising increasing said second radiation dose to a new dose larger than the predetermined dose by a factor of up to at least about 1.5.

4. The method of claim 1, further comprising increasing said second radiation dose to a new dose larger than the predetermined dose by a factor of up to at least about 2.

5. The method of claim 1, further comprising:

delivering a predetermined radiation dosage pattern onto a target surface of the substrate, the dosage pattern comprising,

white regions onto which a radiation dosage at least equal to a predetermined threshold value is delivered, and

black regions onto which a radiation dosage less than said predetermined threshold value is delivered,

wherein step (c) comprises controlling said elements such that each pixel in the plurality of pixels projected onto one of the white regions delivers a radiation dose no greater than said predetermined dose; and

wherein step (d) comprises controlling the elements such that each said selected pixel is projected onto a white region and delivers an increased radiation dose to the white region to compensate at least partially for at least one of;

an effect of a defective element on a pixel adjacent the selected pixel on the same white region, and

an underexposure of the white region at the location of the selected pixel resulting from exposure of said location to a pixel affected by a defective element in another exposure step.

6. The method of claim 5, wherein the substrate comprises a layer of radiation sensitive material having an activation threshold, said predetermined threshold value is said activation threshold, and said target surface is a surface of the layer.

7. The method of claim 6, wherein the normal maximum dose is greater than the predetermined threshold value.

8. The method of claim 6, wherein the predetermined dose is in a range equal to or greater than half the predetermined threshold value and to less than the predetermined threshold value.

9. The method of claim 8, further comprising performing steps (c) and (d) twice to delivering the predetermined radiation dosage pattern to a target area of the target surface.

10. The method of claim 1, further comprising performing steps (c) and (d) first and second times to deliver a predetermined radiation dosage pattern to a target area of the substrate, wherein,

during performing of steps (c) and (d) the first time, the target area is exposed to a first plurality of said pixels corresponding to a first set of elements of a said array, and

during performing of steps (c) and (d) the second time, the target area is exposed to a second plurality of said pixels corresponding to a second, different set of elements of the same said array.

11. The method of claim 10, further comprising:

controlling the first set of elements such that the first plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the second set of elements.

12. The method of claim 10, further comprising:

controlling the second set of elements such that the second plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the first set of elements.

13. The method of claim 10, further comprising:

controlling the first set of elements such that the first plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the first set of elements.

14. The method of claim 10, further comprising:

controlling the second set of elements such that the second plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the second set of elements.

15. The method of claim 1, further comprising:

performing steps (c) and (d) first and second times to deliver a predetermined radiation dosage pattern to a target area of the substrate, wherein

during performing of steps (c) and (d) the first time, the target area is exposed to a first plurality of said pixels corresponding to a first set of elements of a first said array, and

during performing of steps (c) and (d) the second time, the target area is exposed to a second plurality of said pixels corresponding to a second set of elements of a second, different said array.

16. The method of claim 15, further comprising:

controlling the first set of elements such that the first plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the second set of elements.

17. The method of claim 15, further comprising:

controlling the second set of elements such that the second plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the first set of elements.

18. The method of claim 15, further comprising:

controlling the first set of elements such that the first plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the first set of elements.

19. The method of claim 15, further comprising:

controlling the second set of elements such that the second plurality of pixels includes at least one selected pixel arranged to deliver an increased radiation dose to compensate at least partially for an underexposure effect of a defective element of the second set of elements.

20. The method of claim 1, wherein each pixel corresponds to a respective one of said elements.

21. The method of claim 20, wherein step (d) comprises controlling at least one selected element such that at least one corresponding selected pixel delivers an increased radiation dose.

22. The method of claim 20, wherein the array of elements includes a defective element at a known position, and step (d) comprises controlling at least one element immediately adjacent the defective element such that at least one corresponding pixel, immediately adjacent the pixel corresponding to the defective element, delivers an increased radiation dose to compensate at least partially for the effect of the defective element.

23. The method of claim 22, wherein the substrate has a target surface to which a predetermined radiation dosage pattern is to be delivered, the dosage pattern comprising nominal white regions, to which a radiation dosage at least equal to a predetermined threshold value is to be delivered, and nominal black regions, to which a radiation dosage less than said predetermined threshold value is to be delivered, and the step (d) comprises:

compensating for the effect of the defective element by controlling at least one adjacent element when the pixel corresponding to the defective element is projected onto a white region, such that a corresponding adjacent pixel that is projected onto a same white region delivers an increased radiation dose.

24. The method of claim 20, wherein step (d) comprises controlling a selected plurality of elements, such that a corresponding plurality of pixels deliver increased radiation doses to provide the compensation.

25. The method of claim 1, further comprising:

depending an intensity distribution of each pixel on a respective corresponding element in the array and on elements immediately adjacent the respective corresponding element.

26. The method of claim 1, wherein:

step (c) comprises controlling the elements such that each pixel has a peak intensity less than or equal to a predetermined normal maximum intensity; and

step (d) comprises controlling the elements such that said at least one selected pixel has an increased peak intensity higher than the normal maximum intensity.

27. The method of claim 26, further comprising increasing the peak intensity higher than the normal maximum intensity by up to at least a factor of about 1.5.

28. The method of claim 1, further comprising controlling each non-defective element to selectively adopt one of at least three states, said states comprising,

a nominal black state, in which the element interacts with the projection beam so as to make a minimum contribution to the radiation dose delivered by a corresponding pixel;

at least one nominal grey state, in which the element interacts with the projection beam so as to make an increased contribution to the radiation dose delivered by the corresponding pixel; and

at least one nominal white state, in which the element interacts with the projection beam so as to make a contribution to the radiation dose delivered to the corresponding pixel greater than that in any grey state,

wherein step (c) comprises controlling each element to adopt one of the black or grey states,

wherein step (d) comprises controlling at least one selected element to adopt a white state.

29. The method of claim 28, further comprising adjusting, based on the state of an element, a radiation dose delivered by the corresponding pixel by determining the contribution made by interaction of the element with the projection beam to the peak intensity of the corresponding pixel.

30. The method of claim 29, further comprising controlling each non-defective element to selectively adopt one of a series of grey states, each grey state corresponding to a respective contribution to a corresponding pixel'"'"'s peak intensity.

31. The method of claim 30, further comprising controlling each non-defective element to selectively adopt one of a series of white states, each white state corresponding to a respective contribution to a corresponding pixel'"'"'s peak intensity.

32. The method of claim 31, further comprising providing a whitest state as one of the plurality of white state in which the element interacts with the beam to provide a maximum contribution to the peak intensity of the corresponding pixel, the maximum contribution being at least twice as large as the largest contribution corresponding to a grey state.

33. The method of claim 1, further comprising performing an exposure step using steps (c) and (d).

34. A lithographic apparatus comprising:

an illumination system that supplies a projection beam of radiation;

an array of individually controllable elements that patterns the projection beam;

a projection system that projects the patterned beam onto a target portion of a substrate, the patterned beam comprising a plurality of pixels, each pixel delivering a respective radiation dose to the target portion; and

a controller that controls said elements to selectively adopt one of at least three states, said states comprising;

a nominal black state in which the element interacts with the projection beam to make a minimum contribution to the radiation dose delivered by a corresponding pixel in the plurality of pixels;

at least one nominal grey state in which the element interacts with the projection beam as to make an increased contribution, compared to the nominal black state, to the radiation dose delivered by the corresponding pixel in the plurality of pixels; and

at least one nominal white state in which the element interacts with the projection beam to make a contribution to the radiation dose delivered to the corresponding pixel in the plurality of pixels greater than that in the at least one nominal grey state,

wherein the controller controls the elements, such that each element adopts one of the nominal black state or the at least one nominal grey state,

wherein the controller selectively controls the elements to adopt the at least one nominal white state to provide compensation for effects of one or more pixel of the plurality of pixels when the one or more pixels are defective.

35. The lithographic apparatus of claim 34, wherein each element, when operating normally, is controllable to selectively adopt one of a series of grey states.

36. The lithographic apparatus of claim 35, wherein each element, when operating normally, is controllable to selectively adopt one of a series of white states.

37. The lithographic apparatus of claim 36, wherein:

the substrate has a target surface to which a predetermined radiation dosage pattern is to be delivered, the dosage pattern comprising nominal white regions, to which a radiation dosage at least equal to a predetermined threshold value is to be delivered, and nominal black regions, to which a radiation dosage less than said predetermined threshold value is to be delivered;

the series of grey states includes a maximum grey state in which said increased contribution is a maximum for the grey states;

the illumination system and the controller are used to expose the target portion to each pixel for a common exposure time; and

the illumination system and the elements are used to expose the target portion for the common exposure time to a pixel whose corresponding element is in the maximum gray state delivers a dose at least equal to the predetermined threshold value.

38. The lithographic apparatus of claim 36, wherein:

the substrate has a target surface to which a predetermined radiation dosage pattern is to be delivered, the dosage pattern comprising nominal white regions, to which a radiation dosage at least equal to a predetermined threshold value is to be delivered, and nominal black regions, to which a radiation dosage less than said predetermined threshold value is to be delivered;

the series of grey states includes a maximum grey state in which said increased contribution is a maximum for the grey states;

the illumination system and that expose the target portion to each pixel for a common exposure time;

the illumination system and the elements expose the target portion for the common exposure time to a pixel whose corresponding element is in the maximum gray state delivers a dose less than the predetermined threshold value but greater than half the predetermined threshold value.

39. The lithographic apparatus of claim 34, wherein the array of elements comprises a programmable mirror array.