System and method for dose control in a lithographic system

• US 20050270613A1
• Filed: 07/29/2005
• Published: 12/08/2005
• Est. Priority Date: 05/29/2003
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Hintersteiner, Jason D., Bleeker, Arno, van der Mast, Karel
• Granted Patent: US 7,046,413 B2
• Time in Patent Office: Days
• US Class Current: 359/237
• CPC Class Codes: G03F 7/70041 by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose

Abstract

A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).

Claims

1. A system, comprising:

a source of radiation; and

an adjusting system including an attenuator that adjusts radiation output from the source of radiation to produce a desired radiation output signal, wherein the adjusting system is one of a passive adjusting system and an active adjusting system.