Controlled vapor deposition of multilayered coatings adhered by an oxide layer
First Claim
1. A method of depositing a multilayered coating on a substrate, which coating is tailored to provide a particular characteristic behavior, wherein all layers of said multilayered coating are deposited from a vapor phase, and wherein said multilayered coating includes at least one oxide-based layer and at least one organic-based layer.
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Abstract
An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
94 Citations
55 Claims
- 1. A method of depositing a multilayered coating on a substrate, which coating is tailored to provide a particular characteristic behavior, wherein all layers of said multilayered coating are deposited from a vapor phase, and wherein said multilayered coating includes at least one oxide-based layer and at least one organic-based layer.
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38. A method of depositing a multilayered coating on a substrate from a vapor phase, wherein each layer deposition rate, or the rate of deposition of at least one step in a series of steps used to produce an individual layer, is controlled by controlling a total pressure in a processing chamber in which said layer of said multilayered coating is deposited, a partial pressure of at least one precursor, a temperature of a substrate on which said layer of said multilayered coating is deposited, and at least one temperature of a major processing surface inside said processing chamber.
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39. A method of depositing a multilayered coating on a substrate from a vapor phase, wherein each layer deposition, or each deposition step in a series of steps used to produce an individual layer, and a surface roughness of said multilayered coating are controlled by controlling a total pressure in a processing chamber in which said layer of said multilayered coating is deposited, a partial pressure of at least one precursor, a temperature of a substrate on which said layer of said multilayered coating is deposited, and at least one temperature of a major processing surface inside said processing chamber.
- 40. A method of controlling the surface roughness of a multilayered organo-silicon-containing coating on a substrate, wherein said multilayered coating is deposited from a vapor phase, wherein at least one layer is formed using an organosilane precursor which is introduced into a coating deposition chamber in which said multilayered coating is deposited, and wherein a surface roughness of at least one layer is further controlled by controlling a total pressure in said deposition chamber, a partial pressure of at least one precursor, and a temperature of a substrate on which said coating is deposited.
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44. A method of depositing a multilayered coating wherein an oxide-based layer thickness in direct contact with a substrate is controlled as a function of the chemical composition of said substrate, and wherein a SAM organic-based layer is deposited directly over said oxide-based layer, whereby an ability of said SAM organic-based layer to bond to said oxide-based layer is improved due to control of said oxide-based layer surface coverage and thickness.
- 45. A method of depositing a multilayered coating over a substrate, comprising deposition of at least two oxide-based layers and at least one organic-based layer, where each layer is deposited from a vapor phase, wherein said oxide based layer and said organic-based layer are alternated, and wherein an oxide-based layer is deposited directly over a surface of said substrate.
- 48. A structure comprising a substrate with a multilayered coating deposited over a surface of said substrate, wherein said multilayered coating comprises an organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein a thickness of said oxide-based layer which is in direct contact with said substrate is controlled as a function of the chemical composition of said substrate, whereby an ability of said organic-based layer to bond to said oxide-based layer is improved.
- 51. A structure comprising a substrate with a multilayered coating applied over a surface of said substrate, wherein said multilayered coating comprises an organic-based layer deposited directly over an oxide-based layer which is deposited directly over said substrate, and wherein said multilayered coating includes alternating layers of oxide-based material and organic-based material.
Specification