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Plasma processing apparatus and mounting unit thereof

  • US 20050274324A1
  • Filed: 03/31/2005
  • Published: 12/15/2005
  • Est. Priority Date: 06/04/2004
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus for converting a processing gas into a plasma by applying a high frequency power between a mounting table and an upper electrode installed to face each other in a processing chamber and performing a plasma processing on a substrate mounted on the mounting table, the plasma processing apparatus comprising:

  • a protection pipe having one end portion disposed at the mounting table;

    a temperature detection unit for detecting substrate'"'"'s temperature, which is formed of a dielectric material, wherein the temperature detection unit has one end portion disposed at the mounting table and the other end is extracted to outside through the protection pipe;

    power feed path members, provided in the protection pipe, for supplying a high frequency voltage to the mounting table;

    a heating unit, disposed at the mounting table, for heating the substrate; and

    conductive path members, provided in the protection pipe, for supplying a power to the heating unit, wherein the power feed path members and the conductive path members are disposed such that the region having therein the temperature detection unit is an electromagnetic wave-free region where electromagnetic waves traveling from the power feed path members to the conductive path members are offset with each other.

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