Photo-reactive polymer platform for use in biomedical devices

• US 20050276835A1
• Filed: 05/02/2005
• Published: 12/15/2005
• Est. Priority Date: 04/30/2004
• Status: Abandoned Application

• Current Assignee: Massachusetts Institute of Technology
• Original Assignee: Massachusetts Institute of Technology
• Inventors: Langer, Robert S., Lahann, Joerg
• Application Number:
  US11/119,645
• Publication Number:
  US 20050276835A1
• Time in Patent Office: Days
• US Class Current: 424/422
• CPC Class Codes: A61L 27/34 Macromolecular materials
• CPC Class Codes: A61L 31/10 Macromolecular materials
• CPC Class Codes: C08G 2261/3424 non-conjugated, e.g. paracyclophanes or xylenes
• CPC Class Codes: C08G 61/02 Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
• CPC Class Codes: C08G 61/025 Polyxylylenes
• CPC Class Codes: C08L 23/00 Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
• CPC Class Codes: C08L 2666/02 Organic macromolecular compounds, natural resins, waxes or and bituminous materials
• CPC Class Codes: C09D 165/00 Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain C09D107/00 - C09D157/00, C09D161/00 take precedence; Coating compositions based on derivatives of such polymers

Abstract

A polymer having the following structure: where m is 0 to 10000 and n is 0 to 10000. The polymer may be used in a coating such as on a biomedical device. The polymer is an adhesion promotor for a drug delivery system wherein the polymer is coated onto a substrate such that it may be a reactive coating for UV crosslinking. The polymeric coating may also provide an interface for an implant and can be modified with a secondary polymer or polymer combination. The secondary polymer is capable of eluding drugs or encapsulating cells.

Claims

1. A photodefinable polymer having the following structure:

where m is 0 to 10000 and n is 0 to 10000.

4. The polymer of claim 1, wherein the polymer is an adhesion promotor for a drug delivery system.

5. The polymer of claim 4, wherein the polymer is coated onto a substrate such that it is a reactive coating for UV crosslinking.

2. A photodefinable polymer coating, said coating prepared from the following compound:

where m is 0 to 10000 and n is 0 to 10000.

3. A biomedical device having a coating on at least a portion thereof, the coating having a formulation as claimed in claim 2.

6. The polymeric coating of claim 2, wherein the polymeric coating provides an interface for an implant.

7. The polymeric coating of claim 6, wherein the polymeric coating may be modified with a secondary polymer or polymer combination.

8. The polymeric coating of claim 7, wherein the secondary polymer is capable of eluding drugs or encapsulating cells.

9. A polymer coated stent, wherein at least parts of the stent device are coated with the polymer coating according to claim 2.

10. The stent according to claim 9, where the stent is modified with a secondary drug eluding polymer through photoreaction.

11. The biomedical device of claim 3 wherein the device may be selected from a pacemaker, shunt, catheter, artificial heart valves, and embolization coils.

12. The photodefinable polymer coating according to claim 8, wherein the cells are genetically modified.

13. The photodefinable polymer coating according to claim 8, wherein the resulting device is used for gene therapy.

14. A chemical vapor deposition process, said process includes coating a substrate with the photefinable coating according to claim 2.

15. The chemical vapor deposition process of claim 14, wherein [2.2]paracyclophanes are polymerized during the chemical vapor deposition process.

16. The chemical vapor deposition process of claim 14, wherein photolithography is used to create immobilization pattern on a substrate.

17. The chemical vapor deposition of claim 2, wherein a coating is deposited onto a substrate, said process including:

providing purified 4-benzoyl[2.2]paracyclophane;

sublimating the 4-benzoyl[2.2]paracyclophane under a reduced pressure of less than 100 Pa;

heating the sublimated 4-benzoyl[2.2]paracyclophane to approximately 550°

C.-900°

C. to cleave C—

C bonds to produce monomers;

polymerizing the monomers which are absorbed on the substrate at a temperature below 150°

C. to produce a topologically uniform polymer coating.

18. The chemical vapor deposition process of claim 14, wherein the polymer coating is transparent.

19. The chemical vapor deposition process of claim 14, wherein the polymeric coating has a thickness between 40 and 2000 nm.

20. The chemical vapor deposition process as claimed in claim 14, further including masking a surface of the substrate to produce a patterned coating having defined areas, each area having different functional groups.

21. The chemical vapor deposition process as claimed in claim 14 further including a plasma treatment of the substrate prior to the chemical vapor deposition process.

22. The chemical vapor deposition process as claimed in claim 14, wherein a gradient of reactivity is formed.