Use of PMOD materials in layered (3D) manufacturing technology

• US 20050285312A1
• Filed: 06/23/2004
• Published: 12/29/2005
• Est. Priority Date: 06/23/2004
• Status: Abandoned Application

• Current Assignee: Simon Fraser University
• Original Assignee: Simon Fraser University
• Inventors: Svendsen, Leo G., Fury, Michael A.
• Application Number:
  US10/876,087
• Publication Number:
  US 20050285312A1
• Time in Patent Office: Days
• US Class Current: 264/401
• CPC Class Codes: B29C 39/006 Monomers or prepolymers by reaction injection moulding B29C67/246

Abstract

The invention generally encompasses a method for producing a three-dimensional layered structure comprising at least one layer of a metal-containing material in order to provide functionality. The method comprises sequentially forming each of a plurality of layers, wherein each layer of the plurality of layers has predetermined dimensions, and wherein at least one of the layers comprises a metal-containing material. The plurality of layers is stacked to create an integral three-dimensional layered structure with predetermined dimensions.

Claims

1. A method of layered manufacturing, comprising:

sequentially forming each of a plurality of layers, wherein each layer of the plurality of layers has predetermined dimensions, and wherein at least one of the layers comprises a metal-containing material; and

stacking each of the plurality of layers to create an integral three-dimensional layered structure with predetermined dimensions.

2. The method of claim 1, further comprising rinsing the three-dimensional layered structure to remove excess material comprising the metal-containing material.

3. The method of claim 1, further comprising post-exposing the three-dimensional layered structure.

4. The method of claim 1, 2 or 3, further comprising finishing the three-dimensional layered structure.

5. The method of claim 1, wherein the at least one layer comprising a metal-containing material is formed by a process comprising:

applying a precursor comprising at least one metal on a substrate to form a precursor layer;

exposing a predetermined portion of the precursor layer; and

developing the precursor layer, thereby creating a pattern of metal-containing material comprising a remaining portion of the precursor.

6. The method of claim 1, wherein the at least one layer comprising a metal-containing material is formed by a process comprising:

dipping a platform into a vat of precursor material to a predetermined depth, thereby forming a precursor layer of a predetermined thickness, wherein the precursor layer of a predetermined thickness may optionally be formed on an underlying layer on the platform;

exposing a predetermined portion of the precursor layer, thereby creating a pattern of metal-containing material; and

rinsing unexposed precursor material from the pattern of metal-containing material.

7. The method of claim 1, wherein the at least one layer comprising a metal-containing material is formed by a process comprising

applying a precursor comprising at least one metal within a cavity of a three-dimensional layered structure, thereby forming a pattern of metal-containing material in the shape of the cavity;

and

optionally exposing the pattern of metal-containing material.

8. The method of claim 1, wherein the at least one layer comprising a metal-containing material comprises a molecular metal-ligand complex.

9. The method of claim 8, wherein the metal-ligand complex comprises particles in contact with at least one ligand.

10. The method of claim 9, wherein the particles comprise sol particles.

11. The method of claim 9, wherein the particles comprise microparticles.

12. The method of claim 9, wherein the particles comprise nanoparticles.

13. The method of claim 9, wherein the particles comprise ceramics.

14. The method of claim 9, wherein the particles comprise alloys.

15. The method of claim 10, further comprising transforming the metal-ligand complex into a gel.

16. The method of claim 5 or 6, wherein said exposing comprises photochemically reacting, photothermally reacting and combinations thereof.

17. The method of claim 16, wherein said exposing comprises radiating the predetermined portion of the precursor layer with electromagnetic radiation.

18. The method of claim 17, wherein the electromagnetic radiation comprises ultraviolet radiation.

19. The method of claim 5, wherein said developing comprises contacting the predetermined portion with a polar solvent.

20. The method of claim 5, wherein said developing comprises contacting the predetermined portion with a protic solvent.

21. The method of claim 5, further comprising pre-exposing the precursor layer to energy before said exposing.

22. The method of claim 21, wherein said pre-exposing comprises photochemically reacting, photothermally reacting and combinations thereof.

23. The method of claim 22, wherein the pre-exposing comprises radiating the predetermined portion of the precursor layer with electromagnetic radiation.

24. The method of claim 23, wherein the electromagnetic radiation comprises ultraviolet radiation.

25. The method of claim 21, wherein the pre-exposing further comprises selecting a predetermined fraction of a minimum energy necessary for developing the predetermined portion of the precursor.

26. The method of claim 21, further comprising post-exposing the precursor to energy after said exposing.

27. The method of claim 5 further comprising post-exposing the precursor to energy after said exposing.

28. The method of claims 26 or 27, wherein said post-exposing comprises photochemically reacting, photothermally reacting and combinations thereof.

29. The method of claims 26 or 27, wherein the post-exposing comprises radiating the predetermined portion of the precursor layer with electromagnetic radiation.

30. The method of claim 26 or 27, wherein the electromagnetic radiation comprises ultraviolet radiation.