Elongated features for improved alignment process integration
First Claim
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1. A method, comprising:
- forming a plurality of elongated features on one or more semiconductor parts, the elongated features each having an associated long dimension and an associated short dimension, the associated long dimension greater than the associated short dimension; and
forming a plurality of alignment features on at least one of the one or more semiconductor parts, the plurality of alignment features to define an alignment region, the alignment region bordered in a plane by a first outer alignment feature and a second outer alignment feature and extending downward, wherein a portion of at least one of the plurality of elongated features is included in the alignment region.
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Abstract
Improved integration of alignment or overlay and other processes. A substrate may have one or more alignment features, which may be included in alignment marks or overlay features. Elongated features such as dummification features may be used near the alignment features. For example, line-shaped dummification features may be used in an alignment region, where light from an alignment process may interact with both the alignment features and the elongated features. The elongated features may be in the same layer or a different layer than the alignment features.
45 Citations
33 Claims
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1. A method, comprising:
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forming a plurality of elongated features on one or more semiconductor parts, the elongated features each having an associated long dimension and an associated short dimension, the associated long dimension greater than the associated short dimension; and
forming a plurality of alignment features on at least one of the one or more semiconductor parts, the plurality of alignment features to define an alignment region, the alignment region bordered in a plane by a first outer alignment feature and a second outer alignment feature and extending downward, wherein a portion of at least one of the plurality of elongated features is included in the alignment region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method, comprising:
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transmitting light to a plurality of elongated alignment features having a long dimension along a first axis and a short dimension, wherein the transmitted light interacts with the plurality of alignment features during an alignment process;
transmitting the light to a plurality of elongated features each having an associated long dimension along a long axis and an associated short dimension, wherein the light interacts with at least one of the plurality of elongated features during the alignment process;
receiving light that has interacted with the plurality of alignment features and light that has interacted with the plurality of elongated features as received light; and
determining an alignment parameter based on the received light. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An apparatus, comprising:
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one or more semiconductor parts having a plurality of alignment features, the plurality of alignment features defining an alignment region, the alignment region extending from an outer edge of a first outer alignment feature to an outer edge of a second outer alignment feature on a current layer, the alignment region extending downward to one or more previous layers;
one or more elongated features positioned on one of the one or more semiconductor parts, the one or more elongated features at least partially within the alignment region. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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Specification