Method for fabricating CMOS image sensor
First Claim
1. A method for fabricating a CMOS image sensor comprising:
- preparing a semiconductor substrate including a peripheral circuit and a pixel array, wherein the pixel array is comprised of a photodiode and a readout circuit;
defining an active area and a field area in the semiconductor substrate;
forming a field oxide layer in the field area of the semiconductor substrate;
forming gate electrodes in the peripheral circuit and the readout circuit of the pixel array;
forming a photodiode in a photodiode portion of the pixel array;
forming source and drain junctions at both sides of the gate electrode in the semiconductor substrate of the active area;
forming a salicide prevention layer in the semiconductor substrate of the pixel array; and
forming salicide layers in the surface of the gate electrode and the source and drain junctions in the peripheral circuit by using the salicide prevention layer as a mask.
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Accused Products
Abstract
A method for fabricating a CMOS image sensor is disclosed, to minimize the leakage current and to improve the yield, which includes the steps of preparing a semiconductor substrate including a peripheral circuit and a pixel array, wherein the pixel array is comprised of a photodiode and a readout circuit; defining an active area and a field area in the semiconductor substrate; forming a field oxide layer in the field area of the semiconductor substrate; forming gate electrodes in the peripheral circuit and the readout circuit of the pixel array; forming a photodiode in a photodiode portion of the pixel array; forming source and drain junctions at both sides of the gate electrode in the semiconductor substrate of the active area; forming a salicide prevention layer in the semiconductor substrate of the pixel array; and forming salicide layers in the surface of the gate electrode and the source and drain junctions in the peripheral circuit by using the salicide prevention layer as a mask.
26 Citations
6 Claims
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1. A method for fabricating a CMOS image sensor comprising:
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preparing a semiconductor substrate including a peripheral circuit and a pixel array, wherein the pixel array is comprised of a photodiode and a readout circuit;
defining an active area and a field area in the semiconductor substrate;
forming a field oxide layer in the field area of the semiconductor substrate;
forming gate electrodes in the peripheral circuit and the readout circuit of the pixel array;
forming a photodiode in a photodiode portion of the pixel array;
forming source and drain junctions at both sides of the gate electrode in the semiconductor substrate of the active area;
forming a salicide prevention layer in the semiconductor substrate of the pixel array; and
forming salicide layers in the surface of the gate electrode and the source and drain junctions in the peripheral circuit by using the salicide prevention layer as a mask. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification