Lithographic apparatus and device manufacturing method

• US 20060001855A1
• Filed: 06/30/2004
• Published: 01/05/2006
• Est. Priority Date: 06/30/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: De Smit, Joannes Theodoor, Lof, Joeri
• Granted Patent: US 7,116,404 B2
• Time in Patent Office: Days
• US Class Current: 355/69
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A system and method for use in a lithographic environment include an illumination system for supplying a projection beam of radiation, an array of individually controllable elements for patterning the beam, a projection system for projecting the patterned beam onto a target plane, and a substrate table for supporting a substrate such that a target surface of the substrate is coincident with the target plane. The projection system comprises at least one component, including at least an array of lenses arranged so that each lens receives and focuses a respective portion of the patterned beam. The array of lenses projects a radiation pattern onto the target plane. The apparatus also includes a sensor system arranged to detect an intensity distribution of the projected radiation pattern and to provide a corresponding intensity signal, and a positioning system controllable to adjust a position and/or an orientation of at least one of the following: the array of elements; a component of the projection system; and the illumination system. The apparatus also includes a control system which controls the array of elements to pattern the beam, and which also to receives the intensity signal and controls the positioning system according to the detected intensity distribution to adjust the projected radiation pattern, for example to align the patterned beam with the lens array.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam;

a projection system that projects the patterned beam onto a target plane;

a substrate table that supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane;

a sensor system that detects an intensity distribution of a radiation pattern in the patterned beam and that provides an intensity signal indicative of the detected intensity distribution;

a positioning system that adjusts the radiation pattern by adjusting at least one of a position and an orientation of at least one of the array of individually controllable elements, a component of the projection system, and the illumination system; and

a control system that controls the array of individually controllable elements such that they pattern the beam, that directs the radiation pattern on to the sensor system to receive said intensity signal, and that provides a control signal to control the positioning system according to the detected intensity distribution to adjust the radiation pattern,

wherein the projection system comprises at least one component, the at least one component including an array of lenses arranged to receive the patterned beam,

wherein each lens of the array of lenses receives and focuses a respective portion of the patterned beam, and

wherein the array of lenses projects a corresponding radiation pattern onto the target plane.

2. The apparatus of claim 1, wherein the positioning system is controllable to adjust at least one of a position and an orientation of the array of lenses.

3. The apparatus of claim 1, wherein the projection system comprises:

a first portion comprising at least one lens; and

a second portion comprising the array of lenses,

wherein the first portion projects the patterned beam onto the array of lenses.

4. The apparatus of claim 3, wherein the positioning system adjusts at least one of a position and an orientation of the at least one lens of the first portion.

5. The apparatus of claim 3, wherein the second portion comprises:

a mask having an opaque portion arranged to block a portion of the patterned beam, the opaque portion defining an array of windows, each window being aligned with a respective one of the array of lenses and being transparent to the patterned beam.

6. The apparatus of claim 5, wherein the mask is attached to the array of lenses.

7. The apparatus of claim 3, wherein the positioning system comprises:

an actuator that moves the at least one lens of the first portion longitudinally with respect to the patterned beam, so as to adjust a magnification of the patterned beam with respect to the array of lenses.

8. The apparatus of claim 3, wherein the first portion comprises:

a beam expander comprising a series of lens components including a first lens and a second lens.

9. The apparatus of claim 8, wherein the positioning system comprises:

an actuator system that moves at least one of the first and second lenses longitudinally with respect to the patterned beam, so as to adjust a magnification of the patterned beam with respect to the array of lenses.

10. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that moves the array of controllable elements along at least one axis, so as move the projection of the patterned beam on the array of lenses relative to the array of lenses.

11. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that rotates the array of controllable elements about an axis, so as to rotate the projection of the patterned beam on the array of lenses relative to the array of lenses.

12. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that tilts the array of controllable elements about at least one axis, so as to adjust an inclination of the array of controllable elements with respect to the beam.

13. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that moves the array of lenses in a direction perpendicular to the target plane.

14. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that moves the array of lenses along at least one axis parallel to the target plane, so as to move the array of lenses relative to the patterned beam.

15. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that rotates the array of lenses about an axis perpendicular to the target plane, so as to rotate the array of lenses relative to the patterned beam.

16. The apparatus of claim 1, wherein the positioning system comprises:

an actuator that tilts the array of lenses about at least one axis, so as to adjust an inclination of the array of lenses with respect to the patterned beam.

17. The apparatus of claim 1, wherein the sensor system comprises:

a sensor that detects radiation intensity; and

a sensor scanning system that scans the sensor over an area of the target plane onto which the radiation pattern is projected.

18. The apparatus of claim 1, wherein the sensor system comprises:

an array of sensors arranged to detect said intensity distribution.

19. The apparatus of claim 1, wherein:

the control system controls the array of controllable elements pattern the beam with a predetermined geometric pattern, such that the detected intensity distribution comprises a moiré

pattern; and

the control system controls the positioning system according to the moiré

pattern.

20. The apparatus of claim 19, wherein:

the control system recognizes a plurality of moiré

patterns and controls the positioning system according to the recognized pattern to adjust an alignment of the patterned beam with respect to the array of lenses.

21. A device manufacturing method, comprising:

(a) patterning a beam of radiation using an array of individually controllable elements;

(b) projecting the patterned beam onto a target plane using a projection system that includes at least one component;

(c) receiving the patterned beam on the at least one component, such that each lens of an array of lenses receives and focuses a respective portion of the patterned beam;

(d) projecting a corresponding radiation pattern onto the target plane using the array of lenses;

(e) detecting an intensity distribution of the projected radiation pattern at the target plane;

(f) adjusting at least one of a position and an orientation of at least one of the array of controllable elements, a component of the projection system, and the illumination system according to the detected intensity distribution to adjust the projected radiation pattern;

(g) providing and supporting a substrate, such that a target surface of the substrate is substantially coincident with the target plane; and

(h) projecting the beam having said pattern onto a target portion of the target surface of the substrate.

22. The method of claim 21, wherein step (f) comprises:

adjusting at least one of a position and an orientation of the array of lenses.

23. The method of claim 21, wherein the projection system comprises a first portion including at least one lens and a second portion including the array of lenses, wherein:

the first portion projects the patterned beam onto the array of lenses; and

step (f) comprises adjusting at least one of a position and an orientation of the at least one lens of the first portion.

24. The method of claim 23, wherein step (f) comprises:

translating the at least one lens of the first portion longitudinally with respect to the patterned beam, so as to adjust a magnification of the projection of the patterned beam on the array of lenses.

25. The method of claim 24, wherein the first portion comprises a beam expander that includes a series of lens components having a first lens and a second lens, and wherein step (f) comprises:

translating at least one of the first and second lenses longitudinally with respect to the patterned beam, so as to adjust a magnification of the projection of the patterned beam on the array of lenses.

26. The method of claim 21, wherein step (f) comprises:

translating the array of controllable elements along at least one axis so as to translate the projection of the patterned beam on the array of lenses relative to the array of lenses.

27. The method of claim 21, wherein step (f) comprises:

rotating the array of controllable elements about an axis, so as to rotate the projection of the patterned beam on the array of lenses relative to the array of lenses.

28. The method of claim 21, wherein step (f) comprises:

tilting the array of controllable elements about at least one axis so as to adjust an inclination of the array of elements to the beam.

29. The method of claim 21, wherein step (f) comprises:

translating the array of lenses in a direction perpendicular to the target plane.

30. The method of claim 21, wherein step (f) comprises:

translating the array of lenses along at least one axis parallel to the target plane so as to translate the array of lenses relative to the patterned beam.

31. The method of claim 21, wherein step (f) comprises:

rotating the array of lenses about an axis perpendicular to the target plane so as to rotate the array of lenses relative to the patterned beam.

32. The method of claim 21, wherein step (f) comprises:

tilting the array of lenses about at least one axis so as to adjust an inclination of the array of lenses to the patterned beam.

33. The method of claim 21, wherein step (e) comprises:

detecting radiation intensity with a sensor; and

scanning the sensor over an area of the target plane onto which the radiation pattern is projected.

34. The method of claim 21, wherein step (e) comprises:

detecting the intensity distribution using an array of sensors.

35. The method of claim 21, further comprising:

(i) determining a pattern in the detected intensity distribution, the recognized pattern being characteristic of a misalignment between a respective pair of comprising one each of the array of elements, a component of the projection system, and the illumination system; and

wherein step (f) comprises adjusting at least one of a position and an orientation of at least one of the pair to correct the misalignment.

36. The method of claim 21, wherein:

step (e) comprises detecting a moiré

pattern in the projected radiation pattern; and

step (f) comprises adjusting at least one of a position and an orientation of at least one of the array of elements, a component of the projection system, and the illumination system according to the detected moiré

pattern.

37. The method of claim 36, further comprising:

(i) determining the detected moiré

pattern from a plurality of moiré

patterns,

wherein step (f) comprises adjusting at least one of a position and an orientation of at least one of the array of elements, a component of the projection system, and the illumination system according to the detected moiré

pattern.

38. The method of claim 37, wherein:

each moiré

pattern is characteristic of a misalignment between a respective pair selected from the array of controllable elements, a component of the projection system, and the illumination system,

wherein step (f) comprises adjusting at least one of a position and an orientation of at least one of the respective pair corresponding to the detected moiré

pattern.

39. The method of claim 21, wherein the step (f) comprises:

aligning the array of controllable elements and the array of lenses.

40. The method of claim 21, wherein step (f) comprises:

adjusting at least one of a position and an orientation of at least one of the array of controllable elements, a component of the projection system, and the illumination system, to compensate for a non-uniformity of intensity across the beam.

41. The method of claim 40, wherein step (f) comprises:

setting a misalignment between the array of controllable elements and the array of lenses to compensate for said non-uniformity.

42. The method of claim 21, further comprising:

(i) setting the positions and orientations of the array of elements, the components of the projection system, and the illumination system;

(j) detecting a corresponding intensity distribution of the projected radiation pattern on the target plane;

(k) moving at least one of the array of elements, a component of the projection system, and the illumination system;

(l) detecting a corresponding change in the intensity distribution of the projected radiation pattern on the target plane; and

(m) using the change in intensity distribution to determine an optimal position for at least one the array of elements, a component of the projection system, and the illumination system.