Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)

• US 20060003545A1
• Filed: 05/03/2005
• Published: 01/05/2006
• Est. Priority Date: 12/15/2003
• Status: Active Grant

• Current Assignee: Her Majesty The Queen As Represented By The Minister of National Defence of Her Majesty's Canadian Government, Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Veerasamy, Vijayen S.
• Granted Patent: US 7,566,481 B2
• Time in Patent Office: Days
• US Class Current: 438/428
• CPC Class Codes: C03C 17/225 Nitrides
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3441 comprising carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 2217/281 Nitrides
• CPC Class Codes: C03C 2217/282 Carbides, silicides
• CPC Class Codes: C23C 14/0052 Bombardment of substrates by reactive ion beams
• CPC Class Codes: C23C 14/0664 Carbonitrides

Abstract

A method is provided for making a coated article including an anti-etch layer(s) that is resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s). In certain example embodiments, the anti-etch layer(s) is formed using at least one ion beam (possibly in combination with at least one sputtering target). In certain embodiments, a diamond-like carbon (DLC) inclusive layer(s) may be provided over and/or under the anti-etch layer.

Claims

1. A method of making a coated article, the method comprising:

providing a glass substrate; and

forming an anti-etch layer on the substrate that is resistant to attacks by fluoride-based etchant(s) using each of at least one sputtering target and at least one ion source so that ions in an ion beam from the ion source impinge on a layer-forming surface along with material sputtered from the sputtering target.

2. The method of claim 1, wherein the anti-etch layer comprises one or more of:

silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, hydrogenated zirconium carbide, tin oxycarbide nitride, indium oxide, indium molybdenum oxide, cerium oxide, indium tin oxide, and/or magnesium oxide.

3. The method of claim 1, wherein the anti-etch layer comprises one or more of:

silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide.

4. The method of claim 1, wherein when forming the anti-etch layer gas comprising carbon and/or nitrogen flows through the ion source.

5. The method of claim 1, wherein when forming the anti-etch layer gas comprising carbon and nitrogen flows through the ion source.

6. The method of claim 1, wherein the sputtering target comprises one or more of zirconium and silicon.

7. The method of claim 1, wherein the anti-etch layer comprises hydrogen, and wherein the hydrogen content of the anti-etch layer is from about 1-40%.

8. The method of claim 1, wherein the coated article is a window.

9. The method of claim 1, wherein the coated article has a visible transmission of at least about 30%.

10. The method of claim 1, further comprising ion beam depositing a layer comprising diamond-like carbon (DLC) on the glass substrate under and/or over the anti-etch layer.

11. The method of claim 1, further comprising forming a layer comprising silicon oxide and/or silicon nitride on the glass substrate so that the layer comprising silicon oxide and/or silicon nitride is located between the glass substrate and the anti-etch layer.

12. The method of claim 1, wherein the coated article comprises multiple anti-etch layers.

20. The method of claim 1, wherein a dielectric layer is provided between the anti-etch layer and the glass substrate, and wherein the anti-etch layer comprises one or more of:

(a) cerium oxide and (b) indium molybdenum oxide.

21. The method of claim 1, further comprising ion beam depositing a protective layer comprising diamond-like carbon over and contacting the anti-etch layer.

22. The method of claim 20, where the dielectric layer comprises an oxide of silicon, or an oxide of tin and/or indium.

13. A method of making a coated article, the method comprising:

providing a substrate; and

forming an anti-etch layer on the substrate using at least one sputtering target and at least one ion source so that ions from the ion source impinge on a layer-forming surface along with material sputtered from the sputtering target.

14. The method of claim 13, wherein the anti-etch layer comprises one or more of:

silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, hydrogenated zirconium carbide, tin oxycarbide nitride, indium oxide, indium molybdenum oxide, cerium oxide, indium tin oxide, and/or magnesium oxide.

15. The method of claim 13, wherein the anti-etch layer comprises one or more of:

silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide.

16. The method of claim 13, wherein, when forming the anti-etch layer gas comprising carbon and/or nitrogen flows in the ion source.

17. A window comprising:

a glass substrate, and a coating supported by the glass substrate;

wherein the coating comprises a first layer located directly on an contacting the substrate, and an anti-etch layer located over and contacting the first layer, wherein the anti-etch layer comprises one or more of;

silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, hydrogenated zirconium carbide, tin oxycarbide nitride, indium oxide, indium molybdenum oxide, cerium oxide, indium tin oxide, and/or magnesium oxide.

18. The window of claim 17, wherein the anti-etch layer comprises one or more of:

silicon carbide nitride, hydrogenated silicon carbide nitride, zirconium oxycarbide, zirconium carbide, hydrogenated zirconium oxycarbide, and/or hydrogenated zirconium carbide.

19. The window of claim 17, wherein the window comprises first and second of the anti-etch layers, with at least one additional layer provided therebetween.

23. A method of making a coated article, the method comprising:

providing a glass substrate;

forming a dielectric layer on the glass substrate;

forming an anti-etch layer on the glass substrate over at least the dielectric layer, wherein the anti-etch layer comprises one or more of;

(a) cerium oxide and (b) indium molybdenum oxide; and

using an ion source to form a layer comprising diamond-like carbon over and contacting the anti-etch layer.

24. The method of claim 23, wherein the anti-etch layer is deposited via sputtering.

25. The method of claim 23, wherein the anti-etch layer is deposited by sputtering a target comprising one or more of cerium, indium and molybdenum.