Liquid crystal display device and method of manufacturing liquid crystal display device with color filter layer on thin film transistor
First Claim
Patent Images
1. A method of manufacturing a liquid crystal display device, comprising:
- forming a gate line and a gate electrode on a substrate through a first mask process;
forming a gate insulating layer on substantially an entire surface of the substrate including the gate line and the gate electrode;
forming an active layer, an ohmic contact layer, a source electrode, a drain electrode and a data line on the gate insulating layer through a second mask process by using a single mask, the data line crossing the gate line to define a pixel region;
forming a first passivation layer on substantially an entire surface of the substrate including the source and drain electrodes and the data line;
forming a black matrix on the first passivation layer over the active layer through a third mask process;
forming a color filter layer on the first passivation layer in the pixel region through a fourth mask process;
forming a second passivation layer on substantially an entire surface of the substrate including the black matrix and the color filter layer;
forming a photoresist pattern to expose the second passivation layer corresponding to the pixel region and to a portion of the drain electrode through a fifth mask process;
removing the exposed second passivation and removing a portion of the first passivation layer contacting the second passivation layer to thereby expose the portion of the drain electrode;
forming a transparent conductive layer on substantially an entire surface of the substrate including the exposed portion of the drain electrode; and
forming a pixel electrode in the pixel region by removing the photoresist pattern and the transparent conductive layer on the photoresist pattern, the pixel electrode contacting the exposed portion of the drain electrode.
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Abstract
A method of fabricating a liquid crystal display device is provided. The method of fabricating a liquid crystal display device includes forming a thin film transistor including a source electrode and a drain electrode on a substrate, forming a first passivation layer on the substrate, forming a black matrix on the first passivation layer, forming a color filter layer on the first passivation layer in the pixel region, and forming a pixel electrode above the color filter layer and the black matrix by using a single mask.
43 Citations
58 Claims
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1. A method of manufacturing a liquid crystal display device, comprising:
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forming a gate line and a gate electrode on a substrate through a first mask process;
forming a gate insulating layer on substantially an entire surface of the substrate including the gate line and the gate electrode;
forming an active layer, an ohmic contact layer, a source electrode, a drain electrode and a data line on the gate insulating layer through a second mask process by using a single mask, the data line crossing the gate line to define a pixel region;
forming a first passivation layer on substantially an entire surface of the substrate including the source and drain electrodes and the data line;
forming a black matrix on the first passivation layer over the active layer through a third mask process;
forming a color filter layer on the first passivation layer in the pixel region through a fourth mask process;
forming a second passivation layer on substantially an entire surface of the substrate including the black matrix and the color filter layer;
forming a photoresist pattern to expose the second passivation layer corresponding to the pixel region and to a portion of the drain electrode through a fifth mask process;
removing the exposed second passivation and removing a portion of the first passivation layer contacting the second passivation layer to thereby expose the portion of the drain electrode;
forming a transparent conductive layer on substantially an entire surface of the substrate including the exposed portion of the drain electrode; and
forming a pixel electrode in the pixel region by removing the photoresist pattern and the transparent conductive layer on the photoresist pattern, the pixel electrode contacting the exposed portion of the drain electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A liquid crystal display device, comprising:
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a substrate;
a gate line and a gate electrode on the substrate;
a gate insulating layer on the gate line and the gate electrode;
an active layer on the gate insulating layer over the gate electrode;
an ohmic contact layer on the active layer;
a source electrode, a drain electrode and a data line on the ohmic contact layer, the data line crossing the gate line to define a pixel region;
a first passivation layer on the source and drain electrodes and the data line;
a black matrix on the first passivation layer over the active layer;
a color filter layer on the first passivation layer in the pixel region;
a second passivation layer on the black matrix and the color filter layer, the second passivation layer exposing the color filter layer in the pixel region; and
a pixel electrode on the exposed color filter layer in the pixel region, the pixel electrode connected to the drain electrode. - View Dependent Claims (13, 14, 15, 16)
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17. A liquid crystal display device, comprising:
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a lower substrate;
a thin film transistor adjacent to a pixel region, the thin film transistor including;
a gate electrode on the substrate, a source electrode, the source electrode having a first end and a second end, a drain electrode, the drain electrode having a first end and a second end, the second end of the drain electrode facing the first end of the source electrode, and an active layer, the active layer being above the gate electrode and below the source and drain electrodes, the active layer extending beyond the first end of the source electrode and the second end of the drain electrode;
a color filter layer in the pixel region;
a pixel electrode above the color filter layer, the pixel electrode connected to the drain electrode;
an upper substrate above the color filter layer; and
a liquid crystal layer between the lower substrate and the upper substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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38. A method of fabricating a liquid crystal display device, comprising the steps of:
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forming a thin film transistor, the steps of forming the thin film transistor including;
forming a gate electrode on a substrate;
forming a gate insulating layer on the gate electrode and the substrate;
forming a source electrode, a drain electrode, and an active layer on the gate insulating layer by using a single mask;
forming a black matrix above the thin film transistor;
forming a color filter layer in a pixel region; and
forming a pixel electrode above the color filter layer. - View Dependent Claims (39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55)
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56. A method of fabricating a liquid crystal display device, comprising the steps of:
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forming a thin film transistor including a source electrode and a drain electrode on a substrate;
forming a first passivation layer on the substrate;
forming a black matrix on the first passivation layer;
forming a color filter layer on the first passivation layer in a pixel region; and
forming a pixel electrode above the color filter layer and the black matrix by using a single mask. - View Dependent Claims (57, 58)
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Specification