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FEATURE DIMENSION DEVIATION CORRECTION SYSTEM, METHOD AND PROGRAM PRODUCT

  • US 20060007453A1
  • Filed: 07/12/2004
  • Published: 01/12/2006
  • Est. Priority Date: 07/12/2004
  • Status: Active Grant
First Claim
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1. A method for correcting a deviation of a dimension of a feature from a target in a semiconductor process, the method comprising the steps of:

  • first measuring the feature prior to conducting a process relative to the feature to obtain an incoming feature dimension;

    conducting the process based on a process model;

    second measuring the feature after conducting the process to obtain an outgoing feature dimension;

    determining an origin of any deviation of the outgoing feature dimension from a target structure dimension; and

    adjusting, according to the origin, at least one of the measuring steps and the process conducting step to correct for any deviation.

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