Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
First Claim
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1. A method of optimizing a design to be formed on a substrate, comprising the steps of:
- (a) determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design;
(b) determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and
(c) modifying the design at each section based on the amount determined step (b).
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Abstract
A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.
19 Citations
18 Claims
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1. A method of optimizing a design to be formed on a substrate, comprising the steps of:
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(a) determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design;
(b) determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and
(c) modifying the design at each section based on the amount determined step (b). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification