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Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems

  • US 20060010417A1
  • Filed: 03/30/2005
  • Published: 01/12/2006
  • Est. Priority Date: 03/31/2004
  • Status: Active Grant
First Claim
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1. A method of optimizing a design to be formed on a substrate, comprising the steps of:

  • (a) determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design;

    (b) determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and

    (c) modifying the design at each section based on the amount determined step (b).

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