Showerhead with branched gas receiving channel and apparatus including the same for use in manufacturing semiconductor substrates
First Claim
1. A showerhead for use in an apparatus for manufacturing a semiconductor substrate, the showerhead comprising:
- an injection plate defining a bottom face of a gas receiving space in the showerhead;
a gas receiving channel extending within the injection plate;
a plurality of exhausting holes in the injection plate coupled to the gas receiving channel, the exhausting holes being configured to exhaust gas from the gas receiving channel to the bottom face of the gas receiving space; and
a plurality of channels extending through the injection plate from the bottom face of the gas receiving space configured to flow gas from the bottom face of the gas receiving space out of the space.
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Accused Products
Abstract
Showerheads for use in an apparatus for manufacturing a semiconductor substrate include an injection plate defining a bottom face of a gas receiving space in the showerhead and a gas receiving channel extending within the injection plate. A plurality of exhausting holes in the injection plate are coupled to the gas receiving channel. The exhausting holes are configured to exhaust gas from the gas receiving channel to the bottom face of the gas receiving space. A plurality of channels extend through the injection plate from the bottom face of the gas receiving space configured to flow gas from the bottom face of the gas receiving space out of the space.
241 Citations
30 Claims
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1. A showerhead for use in an apparatus for manufacturing a semiconductor substrate, the showerhead comprising:
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an injection plate defining a bottom face of a gas receiving space in the showerhead;
a gas receiving channel extending within the injection plate;
a plurality of exhausting holes in the injection plate coupled to the gas receiving channel, the exhausting holes being configured to exhaust gas from the gas receiving channel to the bottom face of the gas receiving space; and
a plurality of channels extending through the injection plate from the bottom face of the gas receiving space configured to flow gas from the bottom face of the gas receiving space out of the space. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. A substrate treating apparatus for performing a deposition process of forming a thin film on a substrate, the substrate treating apparatus comprising:
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a chamber;
a supporting stand arranged in the chamber such that a substrate is placed thereon; and
a shower head arranged in the chamber to supply a gas onto the substrate placed on the supporting stand, wherein the shower head comprises injection plates arranged to form a plurality of layers such that spaces to which the gas is received are formed on the top surfaces of the injection plates, and wherein each of the respective injection plates comprises a gas receiving channel through which the gas is supplied to the space formed in the top surface thereof and holes that are channels through which the gas is exhausted from the space. - View Dependent Claims (28, 29, 30)
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Specification