Control of plasma transitions in sputter processing systems
10 Assignments
0 Petitions
Accused Products
Abstract
Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.
73 Citations
65 Claims
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1-63. -63. (canceled)
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64. A method for controlling a plasma used for materials processing, the method comprising:
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acquiring a signal associated with a state of the plasma with two or more sensors;
detecting a transition in plasma mode from the signal;
switching between a first and second state in response to detecting a transition in plasma mode; and
shunting a resonant circuit in electrical communication with an output of a power supply and an input of a plasma vessel to permit a resonance of the resonant circuit to cause a change in the plasma mode.
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65. A method for controlling a plasma used for materials processing, the method comprising:
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acquiring a signal associated with a state of the plasma with two or more sensors;
anticipating a transition in plasma mode from the signal;
switching between a first and second state in response to the anticipated transition in plasma mode; and
shunting a resonant circuit in electrical communication with an output of a power supply and an input of a plasma vessel to permit a resonance of the resonant circuit to cause a change in the plasma mode.
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Specification