Lithographic apparatus and device manufacturing method

• US 20060012763A1
• Filed: 07/13/2004
• Published: 01/19/2006
• Est. Priority Date: 07/13/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hinnen, Paul Christiaan, Franciscus Van Haren, Richard Johannes, Gertrudus Simons, Hubertus Johannes
• Granted Patent: US 7,573,574 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70683 Mark designs
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Abstract

A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.

Claims

1. A lithographic apparatus, comprising:

an illumination system that provides a radiation beam;

a product patterning device that patterns the radiation beam with a product pattern representing features of a product device;

a metrology target patterning device that patterns the radiation beam with a metrology target pattern representing at least one metrology target;

a metrology target patterning device controller that adjusts the metrology target pattern independently of said product pattern;

a support structure that supports the product patterning device and the metrology target patterning device, such that they are separated from each other; and

a projection system that projects the radiation patterned by said product patterning device and said metrology target patterning device onto a target portion of a substrate.

2. The lithographic apparatus of claim 1, wherein said metrology target patterning device controller adjusts the metrology target pattern after said product pattern has been performed.

3. The lithographic apparatus of claim 1, wherein at least one of said product patterning device and said metrology target patterning device comprises an array of individually controllable elements.

4. The lithographic apparatus of claim 1, further comprising:

a mask storage device that stores a plurality of masks; and

a mask storage device controller that provides a selected mask from said mask storage device,

wherein at least one of said product patterning device and said metrology target patterning device comprises at least one of the plurality of masks.

5. The lithographic apparatus of claim 1, wherein said metrology target patterning device controller adjusts said metrology target based on information derived from inspection of a previously patterned substrate.

6. The lithographic apparatus of claim 5, further comprising:

a metrology target inspection device that inspects the previously patterned substrate to provide said information to said metrology target patterning device controller.

7. The lithographic apparatus of claim 1, wherein said metrology target patterning device controller provides a metrology target pattern comprising a plurality of metrology targets.

8. The lithographic apparatus of claim 7, wherein two or more of said plurality of metrology targets are positioned in different target portions on said substrate.

9. The lithographic apparatus of claim 8, wherein said different target portions comprise different dies.

10. The lithographic apparatus of claim 1, wherein said metrology target patterning device controller provides metrology targets corresponding to at least one predetermined standard.

11. The lithographic apparatus of claim 1, wherein said at least one metrology target comprises a primary structure and at least one substructure.

12. The lithographic apparatus of claim 11, wherein said substructure has a form different to that of said primary structure.

13. The lithographic apparatus of claim 11, wherein said substructure has a characteristic length scale smaller than that of said primary structure.

14. The lithographic apparatus of claim 11, wherein said primary structure comprises a grating.

15. The lithographic apparatus of claim 1, wherein said metrology target patterning device patterns the radiation beam corresponding to a metrology target and a pattern corresponding to a protective structure for said metrology target.

16. The lithographic apparatus of claim 15, wherein said protective structure comprises at least one copy of said metrology target.

17. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

a control system that controls an array of individually controllable elements to pattern the beam;

a projection system that projects the patterned beam onto a target portion of a substrate,

wherein said control system receives a first data file comprising product pattern data representing features of a product device to be formed, and

wherein said control system receives a second data file comprising metrology target data representing a metrology target pattern and an intended metrology target location on the substrate.

18. The lithographic apparatus of claim 17, further comprising:

a metrology target verification and adaptation device that detects performance of a metrology target based on an analysis of said product pattern data and said metrology target data.

19. The lithographic apparatus of claim 17, further comprising:

a metrology target verification and adaptation device that adjusts said metrology target data to provide an improved metrology target based on the detected performance.

20. A metrology target optimizing method, comprising

pattering a radiation beam with a product pattern using a product patterning device;

patterning the radiation beam with a metrology target pattern using metrology target patterning device;

projecting the radiation patterned by said product patterning device and said metrology target patterning device onto a target portion of a substrate;

inspecting said metrology target pattern generated on said substrate after developing and processing processes; and

updating control data sent to said metrology target patterning device based on said inspecting step.

21. A device manufacturing, method comprising:

patterning a radiation beam with a product pattern using a product patterning device;

patterning the radiation beam with a target pattern using a metrology target patterning device;

projecting the pattern beam patterned by said product patterning device and said metrology target patterning device onto a target portion of a substrate; and

controlling said metrology target patterning device separately from said product patterning device so as to independently change said metrology target without changing said product pattern.