Programmable spatial filter for wafer inspection

• US 20060012781A1
• Filed: 07/14/2004
• Published: 01/19/2006
• Est. Priority Date: 07/14/2004
• Status: Abandoned Application

• Current Assignee: Negevtech Limited (Negevtech)
• Original Assignee: Negevtech Limited (Negevtech)
• Inventors: Dotan, Noam, Fradkin, Keren
• Application Number:
  US10/890,800
• Publication Number:
  US 20060012781A1
• Time in Patent Office: Days
• US Class Current: 356/237.500
• CPC Class Codes: G01N 2021/8822 Dark field detection
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G01N 21/95623 using a spatial filtering method per se G02B
• CPC Class Codes: G01N 2201/0675 SLM

Abstract

A programmable spatial filter for use as a Fourier plane filter in dark field wafer inspection systems, based on the use of MEMS (Micro-Electro-Mechanical Systems) devices. In comparison with prior art systems, especially those using LCD'"'"'s, the use of MEMS devices provide a number of potential advantages, including good transmission in the UV, a high fill factor, polarization independence and a high extinction ratio since the shutter is opaque when closed. The MEMS devices can be flap devices, artificial eyelid, or double shutter devices. Additionally, a novel spatial light modulator (SLM) assembly having a double layer of SLM arrays is described, in which the fill factor is increased in comparison to a single layer SLM using the same devices, by positioning the dead areas of the elements of both arrays collinearly in the modulated beam. This SLM assembly can be implemented using pixelated LCD arrays or MEMS arrays.

Claims

1. An optical inspection system for inspecting a sample, comprising:

a light source for directing an incident light beam onto said sample;

an objective element having a back focal plane and operative to form an image of said sample from light collected from said sample; and

a programmable spatial filter positioned at said back focal plane, said programmable spatial filter comprising an array of Micro-Electro-Mechanical System (MEMS) devices, at least some of said MEMS devices having switched configurations which are alternately generally optically transmissive and optically blocking.

2. An optical inspection system according to claim 1 and also comprising an image analyzer module for analyzing said image and for switching devices of said MEMS array accordingly, such that at least light collected from said sample at selected angles of scattering is blocked.

3. An optical inspection system according to claim 2 and wherein said light collected from said sample at selected angles of scattering arises from selected features of said sample.

4. An optical inspection system according to claim 2 and wherein said selected angles of scattering are predetermined diffraction orders.

5. An optical inspection system according to claim 4 and wherein said light collected from said sample at predetermined diffraction orders arises from repetitive features of said sample.

6. An optical inspection system according to claim 1 and wherein said light source is a visible light source.

7. An optical inspection system according to claim 1 and wherein said light source is an ultra-violet light source.

8. An optical inspection system according to claim 1, wherein at least one of said MEMS devices is an artificial eyelid device.

9. An optical inspection system according to claim 1, wherein at least one of said MEMS devices is a hinged flap device.

10. An optical inspection system according to claim 1, wherein at least one of said MEMS devices is a double shutter flap device.

11. A method of optically inspecting a sample, comprising the steps of;

illuminating said sample with a beam of incident light;

forming an image of said sample by means of an objective element, said objective element having a back focal plane;

positioning at said back focal plane, a programmable spatial filter comprising an array of Micro-Electro-Mechanical System (MEMS) devices, at least some of which have switched alternate configurations which are generally optically transmissive and optically blocking; and

adjusting said programmable spatial filter to a pattern such that information related to selected features of said sample is blocked.

12. A method according to claim 11, wherein said pattern is obtained by analysis of an image of the light distribution at said back focal plane to determine light arising from said selected features of said sample and scattered at specific angles.

13. A method according to claim 12, wherein said specific angles correspond to predetermined diffraction orders, and said selected features of said sample are repetitive features of said sample.

14. A method according to claim 11, wherein said light is in the ultra violet spectral range.

15. A method according to claim 11, wherein said light is in the visible spectral range.

16. A method according to claim 11, wherein at least one of said MEMS devices is an artificial eyelid device.

17. A method according to claim 11, wherein at least one of said MEMS devices is a hinged flap device.

18. A method according to claim 11, wherein at least one of said MEMS devices is a double shutter flap device.

19. A filter for controlling the spatial transmission of a light beam, comprising:

at least a first optical shutter comprising a section switchable between optically transmissive and optically blocking states, and an unswitchable dead area; and

at least a second optical shutter comprising a section switchable between optically transmissive and optically blocking states, and an unswitchable dead area;

wherein said at least second optical shutter is disposed in the path of said light beam serially to said at least first optical shutter and is aligned such that in the path of said light beam, said dead area of said at least second optical shutter overlaps said dead area of said at least first optical shutter, and said at least first and at least second optical shutters are mutually aligned such that in a plane perpendicular to said light beam, said switchable section of said at least first optical shutter and said switchable section of said at least second optical shutter face opposite directions relative to said overlapping dead areas.

24. A filter for controlling the spatial transmission of a light beam, according to claim 19, and wherein at least some of said optical shutters are MEMS devices.

25. A filter for controlling the spatial transmission of a light beam, according to claim 24, and wherein said MEMS devices are flap devices which open generally at right angles to said planes of said devices.

26. A filter for controlling the spatial transmission of a light beam, according to claim 25, and wherein said flap devices of said first array and said flap devices of said second array flip open in opposite directions.

27. A filter for controlling the spatial transmission of a light beam, according to claim 24, and wherein said MEMS devices are artificial eyelid devices which open generally along said planes of said arrays.

28. A filter for controlling the spatial transmission of a light beam, according to claim 27, and wherein said artificial eyelid devices of said first array and said artificial eyelid devices of said second array roll open in opposite directions.

29. A filter for controlling the spatial transmission of a light beam, according to claim 19 and wherein at least some of said optical shutters are LCD devices.

30. A filter for controlling the spatial transmission of a light beam according to claim 19 and wherein said light beam is a visible light beam.

31. A filter for controlling the spatial transmission of a light beam according to claim 19 and wherein said light beam is an ultra-violet light beam.

20. A filter for controlling the spatial transmission of a light beam, comprising:

at least a first optical shutter comprising a section switchable between optically transmissive and optically blocking states, and an unswitchable dead area; and

at least a second optical shutter comprising a section switchable between optically transmissive and optically blocking states, and an unswitchable dead area;

wherein said at least second optical shutter is disposed in the path of said light beam serially to said at least first optical shutter and is aligned such that in the path of said light beam, said dead area of said at least second optical shutter overlaps said dead area of said at least first optical shutter, and said at least first and at least second optical shutters are mutually aligned with their planes generally parallel, and rotated in said planes at essentially 180°

to each other.

21. A filter for controlling the spatial transmission of a light beam, according to claim 20 and wherein said at least first optical shutter is part of a first array of optical shutters, and said at least second optical shutter is part of a second array of optical shutters.

22. A filter for controlling the spatial transmission of a light beam, according to claim 21, and wherein said optical shutters are arranged in rows in said arrays.

23. A filter for controlling the spatial transmission of a light beam, according to claim 22, and wherein said optical shutters are linearly disposed in said rows of said arrays such that said dead areas are spaced apart a distance equal to approximately twice the length of said switchable sections.