Mesostructured film, porous film and the method of preparing the same

• US 20060014028A1
• Filed: 08/11/2003
• Published: 01/19/2006
• Est. Priority Date: 08/09/2002
• Status: Abandoned Application

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Ogawa, Miki
• Application Number:
  US10/521,242
• Publication Number:
  US 20060014028A1
• Time in Patent Office: Days
• US Class Current: 428/446
• CPC Class Codes: B01J 20/103 comprising silica
• CPC Class Codes: B01J 20/28035 with more than one layer, e.g. laminates, separated sheets
• CPC Class Codes: B01J 20/28083 being in the range 2-50 nm, i.e. mesopores
• CPC Class Codes: B01J 2229/64 in or on refractory materials
• CPC Class Codes: B01J 29/0308 Mesoporous materials not having base exchange properties, e.g. Si-MCM-41
• CPC Class Codes: C23C 18/1216 Metal oxides C23C18/1212 takes precedence
• CPC Class Codes: G01N 31/10 using catalysis
• CPC Class Codes: Y10T 428/249953 Composite having voids in a component [e.g., porous, cellular, etc.]

Abstract

It is an object of the present invention to provide a method for preparing mesostructured film having oriented channel structure and which is applicable to preparing mesostructured metal oxide. It is also an object of the present invention to provide meso porous film containing non-silica metal oxide in pore wall and having rod-like pores uniaxially aligned. It is further an object of the present invention to provide method for preparing mesostructured film including the steps of: preparing a reactant solution containing a precursor material for frame of mesostructured material which contains metal oxide, and an amphiphilic material; coating the substrate whose surface has alignment control ability with the reactant solution; and holding the substrate which has been coated with the reactant solution in a vapor-containing atmosphere.

Claims

1. A method for producing a mesostructred film film comprising the steps of:

preparing a reaction solution containing a precursor material for mesostructred film which contains a metal oxide, and an amphiphilic material;

applying the reaction solution onto a substrate having a capability of orienting an aggregate of the amphiphilic material in a predetermined direction; and

forming the mesostructred film having a plurality of the aggregates of the amphiphilic material oriented in the predetermined direction while holding the substrate onto which the reaction solution has been applied in a vapor-containing atmosphere.

2. A method for producing a mesostructred film according to claim 1, wherein the precursor material contains tin.

3. A method for producing a mesostructred film according to claim 1, wherein the precursor material is a metal chloride.

4. A method for producing a mesostructred film according to claim 1, wherein the amphiphilic material is a surfactant.

5. A method for producing a mesostructred film according to claim 1, wherein the step of forming the mesostructred film having a plurality of aggregates of the amphiphilic material oriented in the predetermined direction is performed at a temperature of 100°

C. or less.

6. A method for producing a mesostructred film according to claim 1, wherein the step of forming the mesostructred film having a plurality of aggregates of the amphiphilic material oriented in the predetermined direction is performed at a relative humidity in a range of from 40% to 100%.

7. A porous film on a substrate, comprising a plurality of tube-shaped pores oriented in a predetermined direction and containing a metal oxide in a pore wall of the porous film.

8. A porous film according to claim 7, the porous film comprising tin oxide in the pore wall.

9. A porous film according to claim 7, wherein the tube-shaped pores are mesopores each having a pore diameter of from 2 nm to 50 nm.

10. A porous film according to claim 7, wherein the pores hold an aggregate of an amphiphilic material.

11. A porous film according to claim 7, wherein at least 60% of the tube-shaped pores are oriented within a range of −

40°

to +40°

in an orientation direction distribution as measured by an in-plane X-ray diffraction analysis.

12. A porous film according to claim 7, wherein the substrate has a capability of orienting the aggregate of the amphiphilic material in the predetermined direction.

13. A porous film according to claim 12, wherein the substrate having the capability of orienting the aggregate of the amphiphilic material in the predetermined direction is a substrate on the surface of which a polymer compound film provided with anisotropy has been formed.

14. A porous film according to claim 12, wherein the substrate having the capability of orienting the aggregate of the amphiphilic material in the predetermined direction is a monocrystal substrate having such an orientation that an atomic arrangement at a surface of the substrate has two-fold symmetry.

15. A porous film according to claim 14, wherein the monocrystal substrate is of the (110) surface of silicon monocrystal.

16. A porous film according to claim 12, wherein the substrate having the capability of orienting the aggregate of the amphiphilic material in the predetermined direction is a substrate on the surface of which a polymer compound film provided with anisotropy or a Langmuir-Blodgett film of a polymer compound has been formed.

17. A method for producing a porous film comprising the steps of:

preparing a reaction solution containing a precursor material for a porous material which contains a metal oxide, and an amphiphilic material;

applying the reaction solution onto a substrate having a capability of orienting an aggregate of the amphiphilic material in a predetermined direction;

forming the porous material having a plurality of the aggregates of the amphiphilic material oriented in the predetermined direction while holding the substrate onto which the reaction solution has been applied in a vapor-containing atmosphere; and

removing the amphiphilic material to form a pore.