Endpoint detecting device in semiconductor manufacturing system
First Claim
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1. An endpoint detecting device to detect an endpoint during an etching process, comprising:
- a filter having at least two incidence surfaces adapted to receive plasma wavelengths;
a sensor to detect the received plasma wavelengths and generate a corresponding signal;
an analog/digital (A/D) converter to convert the corresponding signal to a digital signal; and
a controller responsive to the digital signal and adapted to determine the endpoint.
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Abstract
An endpoint detecting device used during a semiconductor manufacturing process to manufacture semiconductor devices. The endpoint detecting device is constructed such that a filter has a polyhedral shape or a semi-spherical shape.
8 Citations
12 Claims
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1. An endpoint detecting device to detect an endpoint during an etching process, comprising:
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a filter having at least two incidence surfaces adapted to receive plasma wavelengths;
a sensor to detect the received plasma wavelengths and generate a corresponding signal;
an analog/digital (A/D) converter to convert the corresponding signal to a digital signal; and
a controller responsive to the digital signal and adapted to determine the endpoint. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An endpoint detecting device to detect an endpoint during an etching process, comprising:
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a filter having a curved incidence surface adapted to receive plasma wavelengths;
a sensor to receive the plasma wavelengths and generate corresponding signal;
an analog/digital (A/D) converter to convert the corresponding signal to a digital signal; and
a controller responsive to the digital signal and adapted to determine the etching endpoint. - View Dependent Claims (8, 9, 10, 11, 12)
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Specification
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Current AssigneeSamsung Electronics Co. Ltd.
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Original AssigneeSamsung Electronics Co. Ltd.
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InventorsPark, Bong-Jin
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Application NumberUS11/151,236Publication NumberTime in Patent OfficeDaysField of SearchUS Class Current156/345.250CPC Class CodesG01N 21/73 using plasma burners or tor...H01J 37/32935 Monitoring and controlling ...H01J 37/32963 End-point detectionH01L 22/26 Acting in response to an on...
