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Lithographic apparatus having double telecentric illumination

  • US 20060017902A1
  • Filed: 07/26/2004
  • Published: 01/26/2006
  • Est. Priority Date: 07/26/2004
  • Status: Active Grant
First Claim
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1. A system, comprising, an illumination system that generates an illumination beam of radiation;

  • a reflecting system;

    a pattern generator defining an object plane; and

    a projection system, wherein a reflecting portion of the reflecting system is substantially parallel to a reflecting portion of the pattern generator when reflecting portion of the pattern generator is in a default state, the reflecting portion of the pattern generator patterning the illumination beam and directing the patterned illumination beam to a substrate defining an image plane via the projection system, such that the illumination beam is telecentric proximate the object plane and the patterned illumination beam is telecentric proximate the image plane.

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