Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A lithographic apparatus comprising:
- an illumination system that supplies a beam of radiation;
an array of individually controllable elements that pattern the beam;
a projection system that projects the patterned beam onto a target portion of a substrate; and
a controller that controls a pattern formed using the array of individually controllable elements using (a) intended pattern data, which corresponds to a pattern to be exposed on the substrate, and (b) processing conditions data, which corresponds to at least one processing condition of the substrate.
2 Assignments
0 Petitions
Accused Products
Abstract
A lithographic apparatus is provided that uses an array of individually controllable elements to pattern the beam of radiation. The critical dimension uniformity of a substrate patterned using the apparatus is improved by adjusting the pattern data provided to the array of individually controllable elements to compensate for process variation.
42 Citations
13 Claims
-
1. A lithographic apparatus comprising:
-
an illumination system that supplies a beam of radiation;
an array of individually controllable elements that pattern the beam;
a projection system that projects the patterned beam onto a target portion of a substrate; and
a controller that controls a pattern formed using the array of individually controllable elements using (a) intended pattern data, which corresponds to a pattern to be exposed on the substrate, and (b) processing conditions data, which corresponds to at least one processing condition of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A device manufacturing method comprising:
-
forming a pattern with an array of individually controllable elements using (1) intended pattern data, which corresponds to a pattern to be exposed on the substrate, and (2) processing conditions data, which corresponds to at least one processing condition of the substrate;
patterning a beam of radiation using the formed patterned on the array of individually controllable elements; and
projecting the patterned beam onto a target portion of a substrate.
-
Specification