Process for producing chemical adsorption film and chemical adsorption film

• US 20060019034A1
• Filed: 07/20/2005
• Published: 01/26/2006
• Est. Priority Date: 07/26/2004
• Status: Active Grant

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Toyoda, Naoyuki
• Granted Patent: US 7,776,397 B2
• Time in Patent Office: Days
• US Class Current: 427/322
• CPC Class Codes: B05D 1/18 performed by dipping
• CPC Class Codes: B05D 2203/35 Glass
• CPC Class Codes: C03C 17/28 with organic material C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/30 with silicon-containing compounds
• CPC Class Codes: C03C 17/42 at least one coating of an organic material and at least one non-metal coating
• CPC Class Codes: H05K 2203/013 Inkjet printing, e.g. for printing insulating material or resist
• CPC Class Codes: H05K 2203/107 Using laser light
• CPC Class Codes: H05K 2203/1173 Differences in wettability, e.g. hydrophilic or hydrophobic areas
• CPC Class Codes: H05K 3/1208 Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns providing shape patterns H05K3/1258; adhesion treatments H05K3/38
• CPC Class Codes: H05K 3/125 by ink-jet printing

Abstract

The process for forming a chemical adsorption film of the present invention includes a hydrophilic treatment step ST1 of making the surface of the material hydrophilic, a treatment step ST2 of adhering an acid or a base onto the surface of the base material which is made hydrophilic, and a film forming step ST3 of contacting the surface of the base material on which an acid or a base is adhered with a chemical adsorbent to form a chemical adsorption film on the surface.

Claims

1. A process for forming a chemical adsorption film on a surface of a base material, comprising:

a treatment step of adhering an acid or a base onto the surface of the base material, and

a film forming step of contacting the base material, after the treatment step, with a chemical adsorbent to adhere the chemical adsorbent onto the surface of the base material.

2. A process for forming a chemical adsorption film as set forth in claim 1, wherein the film forming step is a step of immersing the base material in a chemical adsorbent solution.

3. A process for forming a chemical adsorption film as set forth in claim 1, wherein the film forming step is a step of contacting the surface of the base material with a vapor of the chemical adsorbent.

4. A process for forming a chemical adsorption film as set forth in claim 1, wherein the base material has a hydrophilic group on the surface thereof, and the chemical adsorbent has a functional group which is reactive with hydrophilic groups on end thereof.

5. A process for forming a chemical adsorption film as set forth in claim 4, wherein the surface of the base material is subjected to a hydrophilic treatment before the treatment step.

6. A process for forming a chemical adsorption film as set forth in claim 4, wherein the chemical adsorbent has one or more selected from the group consisting of a silyl group (—

SiX), a titanyl group (—

TiX), and a stannyl group (—

SnX) (in the formulae, X represents a halogen or an alkoxy group) on an end of a molecule thereof.

7. A process for forming a chemical adsorption film as set forth in claim 1, wherein the treatment step is a step of supplying a solution of an acid or a base onto the surface of the base material.

9. A chemical adsorption film formed by the process as set forth in claim 1.

10. A process for forming a chemical adsorption film as set forth in claim 2, wherein the base material has a hydrophilic group on the surface thereof, and the chemical adsorbent has a functional group which is reactive with hydrophilic groups on end thereof.

11. A process for forming a chemical adsorption film as set forth in claim 3, wherein the base material has a hydrophilic group on the surface thereof, and the chemical adsorbent has a functional group which is reactive with hydrophilic groups on end thereof.

12. A chemical adsorption film formed by the process as set forth in claim 2.

13. A chemical adsorption film formed by the process as set forth in claim 3.

14. A chemical adsorption film formed by the process as set forth in claim 4.

15. A chemical adsorption film formed by the process as set forth in claim 5.

16. A chemical adsorption film formed by the process as set forth in claim 6.

17. A chemical adsorption film formed by the process as set forth in claim 7.

8. A chemical adsorption film comprising a base material and a chemical adsorbent combined with the surface of the base material, wherein the base material has an acid or a base on the surface thereof.