Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic apparatus comprising:
- an illumination system that supplies a beam of radiation;
an array of individually controllable elements that pattern the beam; and
a projection system that projects the patterned beam onto a target portion of a substrate, wherein the projection system comprises an array of lenses that receive the patterned beam, divide the patterned beam into a plurality of substantially polygonal portions, and focus each substantially polygonal portion to form a respective beam spot on the target portion of the substrate.
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Accused Products
Abstract
A lithographic apparatus includes an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, a substrate table for supporting a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system comprises an array of lenses arranged to receive the patterned beam, divide the patterned beam into a plurality of substantially polygonal portions, and focus each substantially polygonal portion to form a respective radiation spot on the target portion of the substrate. In one example, the illumination system comprises an illuminator arranged to receive a beam of radiation from a radiation source, the illuminator comprising an array of lenses arranged to divide the beam of radiation from the source into a plurality of substantially polygonal portions and to focus each substantially polygonal portion onto a respective one of the array of individually controllable elements.
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Citations
20 Claims
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1. A lithographic apparatus comprising:
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an illumination system that supplies a beam of radiation;
an array of individually controllable elements that pattern the beam; and
a projection system that projects the patterned beam onto a target portion of a substrate, wherein the projection system comprises an array of lenses that receive the patterned beam, divide the patterned beam into a plurality of substantially polygonal portions, and focus each substantially polygonal portion to form a respective beam spot on the target portion of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A lithographic apparatus, comprising:
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an illuminator that receives a beam of radiation from a radiation source;
an array of lenses that receive the beam from the illuminator, divide the beam into a plurality of substantially polygonal portions, and focus each substantially polygonal portion onto a respective one of an array of individually controllable elements to pattern the polygonal portions; and
a projection system that projects the patterned beams onto a target portion of a substrate.
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19. A device manufacturing method, comprising:
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(a) patterning a beam of radiation with an array of individually controllable elements;
(b) projecting the patterned beam onto a target portion of a substrate;
(c) dividing the patterned beam into a plurality of substantially polygonal portions; and
(d) focusing the substantially polygonal portions to form respective beam spots on the target portion of the substrate.
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20. A device manufacturing method comprising the steps of:
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(a) dividing a beam received from a radiation source into a plurality of substantially polygonal portions;
(b) focusing the substantially polygonal portions onto respective individually controllable element in an array of individually controllable elements;
(c) patterning the focused beams with the respective individually controllable elements in the array of individually controllable elements; and
(d) projecting the patterned beam onto a target portion of a substrate.
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Specification