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Lithographic apparatus and device manufacturing method

  • US 20060023192A1
  • Filed: 07/30/2004
  • Published: 02/02/2006
  • Est. Priority Date: 07/30/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illumination system that supplies a beam of radiation;

    an array of individually controllable elements that pattern the beam; and

    a projection system that projects the patterned beam onto a target portion of a substrate, wherein the projection system comprises an array of lenses that receive the patterned beam, divide the patterned beam into a plurality of substantially polygonal portions, and focus each substantially polygonal portion to form a respective beam spot on the target portion of the substrate.

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