Processing apparatus and processing method

• US 20060027167A1
• Filed: 09/23/2005
• Published: 02/09/2006
• Est. Priority Date: 03/25/2003
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Gomi, Atsushi, Ishizaka, Tadahiro, Oshima, Yasuhiro, Kawamura, Kohei, Shigeoka, Takashi, Kojima, Yasuhiko, Fukuda, Yukio, Arami, Junichi, Yoshii, Naoki
• Granted Patent: US 7,717,061 B2
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: C23C 16/34 Nitrides C23C16/303 takes precedence
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/45542 Plasma being used non-continuously during the ALD reactions
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: Y10T 137/86558 Plural noncommunicating flow paths
• CPC Class Codes: Y10T 137/86566 Rotary plug
• CPC Class Codes: Y10T 137/86638 Rotary valve
• CPC Class Codes: Y10T 137/86726 Valve with bypass connections
• CPC Class Codes: Y10T 137/86743 Rotary
• CPC Class Codes: Y10T 137/86751 Plug
• CPC Class Codes: Y10T 137/86871 Plug

Abstract

A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).

Claims

1. A processing apparatus comprising:

an excitation device for exciting a processing gas to be supplied;

a processing vessel into which an excited processing gas is supplied, the processing vessel being connected to the excitation device;

a switching mechanism, provided between the excitation device and the processing vessel, for switching a flow of the excited processing gas from the excitation device; and

a bypass line connected to the switching mechanism,

wherein the switching mechanism changes the flow the excited processing gas from the excitation device into one of the processing vessel and the bypass line.

2. The processing apparatus of claim 1, wherein the switching mechanism has two opening/closing valves that are synchronously operated.

3. The processing apparatus of claim 1, wherein the switching mechanism is a three-way valve.

4. The processing apparatus of claim 1, wherein the switching mechanism is a rotational three-way valve whose valve body is continuously rotated in one direction to switch a flow path.

5. The processing apparatus of claim 1, wherein the processing vessel can be connected to a gas supply unit for supplying a process gas other than the excited processing gas, the processing vessel being configured to alternately supply therein the excited processing gas and the process gas other than the excited processing gas.

6. A processing method comprising:

a first process for exciting a processing gas to supply same into a processing vessel for a predetermined time;

a second process for switching a flow of an excited processing gas from the processing vessel into a bypass line, and directing the excited processing gas to the bypass line for a predetermined time, both of which are carried out while continuously exciting the processing gas; and

a third process for repeatedly performing the first and the second process.

7. A processing method comprising:

a first process for supplying an excited first processing gas into a processing vessel for a predetermined time;

a second process for switching a flow of the excited first processing gas from the processing vessel into a bypass line, and directing the excited first processing gas to the bypass line for a predetermined time, both of which are carried out while continuously exciting the first processing gas;

a third process for supplying a second processing gas into the processing vessel for a predetermined time;

a fourth process for switching the flow of the excited first processing gas from the bypass line into the processing vessel, and directing the excited first processing gas to the processing vessel for a predetermined time, both of which are carried out while continuously exciting the first processing gas; and

a fifth process for repeatedly performing the first through fourth processes.