Method and apparatus for angular-resolved spectroscopic lithography characterization
First Claim
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1. A scatterometer configured to measure a property of a substrate, comprising:
- a high numerical aperture lens; and
a detector configured to detect an angle-resolved spectrum of a radiation beam reflected from a surface of the substrate, wherein the property of the substrate can be measured by measuring, in the pupil plane of the high numerical aperture lens, a property of the reflected spectrum at a plurality of angles simultaneously.
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Abstract
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.
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Citations
46 Claims
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1. A scatterometer configured to measure a property of a substrate, comprising:
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a high numerical aperture lens; and
a detector configured to detect an angle-resolved spectrum of a radiation beam reflected from a surface of the substrate, wherein the property of the substrate can be measured by measuring, in the pupil plane of the high numerical aperture lens, a property of the reflected spectrum at a plurality of angles simultaneously. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A scatterometer configured to measure a property of a substrate, comprising:
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a high numerical aperture lens; and
a space between the substrate and the high numerical aperture lens comprising a liquid, wherein the property of the substrate can be measured by measuring, in the pupil plane of the high numerical aperture lens, a property of an angle-resolved spectrum of a radiation beam reflected from a surface of the substrate, at a plurality of angles and a plurality of wavelengths simultaneously. - View Dependent Claims (20, 21, 22, 23, 24)
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25. A scatterometer configured to measure a property of a substrate, comprising:
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a high numerical aperture lens; and
an edge adapted to be placed in one of opposite halves of an intermediate object plane, wherein the property of the substrate can be measured by measuring, in the pupil plane of the high numerical aperture lens, a property of an angle-resolved spectrum of a radiation beam reflected from a surface of the substrate, at a plurality of angles and a plurality of wavelengths simultaneously. - View Dependent Claims (26, 27, 28, 29, 30)
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31. A scatterometer configured to measure a property of a substrate, comprising:
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a high numerical aperture lens; and
a detector configured to detect an angle-resolved radiation spectrum reflected from a surface of the substrate, wherein the property of the substrate can be measured by measuring, in the pupil plane of the high numerical aperture lens, a property of the reflected spectrum at a plurality of angles and wavelengths simultaneously. - View Dependent Claims (32, 33, 34)
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35. An inspection method, comprising:
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printing a pattern onto a substrate; and
measuring, in the pupil plane of a high numerical aperture lens, a reflected spectrum of the pattern. - View Dependent Claims (36, 37, 38)
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39. An inspection method, comprising:
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providing two gratings layered in parallel but misaligned, thereby creating an overlay of one grating with respect to the other;
measuring a reflected spectrum of the gratings using a scatterometer; and
deriving the extent of the overlay from the asymmetry in the reflected spectrum. - View Dependent Claims (40, 41, 42)
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43. A device manufacturing method, comprising:
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projecting a beam of radiation onto a target portion of a substrate, using a scatterometer to measure, in the pupil plane of a high numerical aperture lens, a reflected spectrum of the beam through a predetermined range of angles and wavelengths simultaneously. - View Dependent Claims (44, 45)
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46. A method of creating an angle-resolved spectroscopic image of a grating pattern, comprising using apertures that mimic lithography exposure conditions when the grating pattern is created.
Specification