Systems and methods for forming metal-containing layers using vapor deposition processes

• US 20060035462A1
• Filed: 08/13/2004
• Published: 02/16/2006
• Est. Priority Date: 08/13/2004
• Status: Active Grant

• Current Assignee: Micron Technology, Inc.
• Original Assignee: Micron Technology, Inc.
• Inventors: Millward, Dan B.
• Granted Patent: US 7,300,873 B2
• Time in Patent Office: Days
• US Class Current: 438/681
• CPC Class Codes: C23C 16/308 Oxynitrides
• CPC Class Codes: C23C 16/34 Nitrides C23C16/303 takes precedence
• CPC Class Codes: C23C 16/40 Oxides
• CPC Class Codes: H01L 21/28562 Selective deposition

Abstract

A method of forming (and an apparatus for forming) a metal containing layer on a substrate, particularly a semiconductor substrate or substrate assembly for use in manufacturing a semiconductor or memory device structure, using one or more homoleptic and/or heteroleptic precursor compounds that include, for example, guanidinate, phosphoguanidinate, isoureate, thioisoureate, and/or selenoisoureate ligands using a vapor deposition process is provided.

Claims

1. A method of forming a metal-containing layer on a substrate, the method comprising:

providing a substrate;

providing a precursor composition comprising at least one compound of the formula (Formula I);

wherein;

M is selected from the group consisting of a Group 2 to Group 15 metal, a lanthanide, an actinide, and combinations thereof;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

each R¹, R², and R³ is independently an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1;

vaporizing the precursor composition; and

contacting the vaporized precursor composition to form a metal-containing layer on the substrate using a vapor deposition process.

2. The method of claim 1 wherein X is oxygen or sulphur.

3. The method of claim 1 wherein the organic group is selected from the group consisting of an alkyl group, an aliphatic group, a cyclic group, and combinations thereof.

4. The method of claim 1 wherein L is selected from the group consisting of halides, amides, alkoxides, amidoxylates, amidinates, amidates, carboxylates, beta-diketonates, beta-imineketones, beta-diketiminates, carbonylates, ketiminates, and combinations thereof.

5. The method of claim 1 wherein M is selected from the group consisting of Group 3 to Group 5 metals, Group 13 metals, lanthanides, and combinations thereof.

6. The method of claim 5 wherein M is selected from the group consisting of Hf, Zr, Al, La, Pr, and combinations thereof.

7. The method of claim 1 wherein the metal-containing layer is a metal-oxide layer.

8. The method of claim 1 wherein the metal-containing layer is a metal-nitride layer.

9. The method of claim 1 wherein the substrate is selected from the group consisting of a semiconductive material, a conductive material, a conductive metal-nitride, a conductive metal, and combinations thereof.

10. The method of claim 1 wherein the metal-containing layer has a thickness of about I angstrom to about 500 angstroms.

11. The method of claim 1 wherein R⁴ is hydrogen.

12. The method of claim 1 wherein the organic group independently comprises 1 to 10 carbon atoms.

13. The method of claim 12 wherein the organic group independently comprises 1 to 4 carbon atoms.

14. The method of claim 1 wherein the vapor deposition process is a chemical vapor deposition process.

15. The method of claim 1 wherein the vapor deposition process is an atomic layer deposition process comprising a plurality of deposition cycles.

16. A method of manufacturing a semiconductor structure, the method comprising:

providing a semiconductor substrate or substrate assembly;

providing at least one precursor compound of the formula (Formula I);

wherein;

M is selected from the group consisting of a Group 2 to Group 15 metal, a lanthanide, an actinide, and combinations thereof;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

each R¹, R², and R³ is independently an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1;

providing at least one reaction gas;

vaporizing the precursor compound of Formula I; and

contacting the vaporized precursor compound of Formula I and the reaction gas with the substrate to form a metal-containing layer on the semiconductor substrate or substrate assembly using a vapor deposition process.

17. The method of claim 16 wherein X is oxygen or sulfur.

18. The method of claim 16 wherein the organic group is selected from the group consisting of an alkyl group, an aliphatic group, a cyclic group, and combinations thereof.

19. The method of claim 16 wherein R⁴ is hydrogen.

20. The method of claim 16 wherein L is selected from the group consisting of halides, amides, alkoxides, amidoxylates, amidinates, amidates, carboxylates, beta-diketonates, beta-imineketones, beta-diketiminates, carbonylates, ketiminates, and combinations thereof.

21. The method of claim 16 wherein the metal-containing layer is a metal-oxide layer.

22. The method of claim 16 wherein the metal-containing layer is a metal-nitride layer.

23. The method of claim 22 wherein the metal oxide layer is a dielectric layer.

24. The method of claim 16 wherein the metal-containing layer is a metal-nitride layer.

25. The method of claim 16 wherein M is selected from the group consisting of Group 3 to Group 5 metals, Group 13 metals, lanthanides, and combinations thereof.

26. The method of claim 25 wherein M is selected from the group consisting of Hf, Zr, Al, La, Pr, and combinations thereof.

27. The method of claim 16 wherein the metal oxide layer has a thickness of about 1 angstrom to about 500 angstroms.

28. The method of claim 16 wherein the organic group independently comprises 1 to 10 carbon atoms.

29. The method of claim 28 wherein the organic group independently comprises 1 to 4 carbon atoms.

30. The method of claim 16 wherein the at least one reaction gas is selected from the group consisting of oxygen, water vapor, ozone, nitrogen oxides, sulfur oxides, hydrogen, hydrogen sulfide, hydrogen selenide, hydrogen telluride, hydrogen peroxide, ammonia, organic amine, silane, disilane and higher silanes, diborane, plasma, air, borazene, carbon monoxide, alcohols, and combinations thereof.

31. The method of claim 16 further comprising an inert gas selected from the group consisting of nitrogen, argon, helium, and combinations thereof.

32. The method of claim 16 wherein the substrate is selected from the group consisting of a semiconductive material, a conductive material, a conductive metal-nitride, a conductive metal, and combinations thereof.

33. The method of claim 32 wherein the substrate is selected from the group of undoped silicon, doped silicon, borophosphosilicate glass (BPSG), tetraethylorthosilicate oxide (TEOS), TiN, TaN, GaAs, SiO₂, RuO, TaSiN, Pt, Ir, Rh, Ru, Al, Cu, W, and combinations thereof.

34. The method of claim 16 wherein the vapor deposition process is a chemical vapor deposition process.

35. The method of claim 34 wherein the temperature of the semiconductor substrate or substrate assembly is about 150°

C. to about 600°

C.

36. The method of claim 31 wherein the semiconductor substrate or substrate assembly is in a deposition chamber that has a pressure of about 10⁻

6 torr to about 10 torr.

37. The method of claim 16 wherein the vapor deposition process is an atomic layer deposition process comprising a plurality of deposition cycles.

38. The method of claim 37 wherein during the atomic layer deposition process the metal-containing layer is formed by alternately introducing the vaporized precursor compound of Formula I and the reaction gas during each deposition cycle.

39. The method of claim 37 wherein the temperature of the semiconductor substrate or substrate assembly is about 25°

C. to about 400°

C.

40. The method of claim 34 wherein the semiconductor substrate or substrate assembly is in a deposition chamber that has a pressure of about 10⁻

6 torr to about 10 torr.

41. A method of manufacturing a semiconductor structure, the method comprising:

providing a semiconductor substrate or substrate assembly within a deposition chamber;

providing a vapor comprising at least one precursor compound of the formula (Formula I);

wherein;

M is selected from the group consisting of a Group 2 to Group 15 metal, a lanthanide, an actinide, and combinations thereof;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

each R¹, R², and R³ is independently an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1;

directing the vapor comprising the at least one precursor compound of Formula I to the semiconductor substrate or substrate assembly and allowing the at least one compound to chemisorb to at least one surface of the semiconductor substrate or substrate assembly;

providing at least one reaction gas; and

directing the at least one reaction gas to the semiconductor substrate or substrate assembly with the chemisorbed species thereon to form a metal-containing layer on at least one surface of the semiconductor substrate or substrate assembly.

42. The method of claim 41 wherein X is oxygen or sulfur.

43. The method of claim 41 wherein the organic group is selected from the group consisting of an alkyl group, an aliphatic group, a cyclic group, and combinations thereof.

44. The method of claim 41 wherein L is selected from the group consisting of halides, amides, alkoxides, amidoxylates, amidinates, amidates, carboxylates, beta-diketonates, beta-imineketones, beta-diketiminates, carbonylates, ketiminates, and combinations thereof.

45. The method of claim 41 wherein the metal-containing layer is a metal-oxide layer.

46. The method of claim 41 wherein the metal-containing layer is a metal-nitride layer.

47. The method of claim 41 wherein providing a vapor comprising at least one precursor compound of Formula I, directing the vapor to the semiconductor substrate or substrate assembly, providing at least one reaction gas, and directing the at least one reaction gas to the semiconductor substrate or substrate assembly is repeated at least once.

48. The method of claim 41 wherein the at least one reaction gas is selected from the group consisting of oxygen, water vapor, ozone, nitrogen oxides, sulfur oxides, hydrogen, hydrogen sulfide, hydrogen selenide, hydrogen telluride, hydrogen peroxide, ammonia, organic amine, silane, disilane and higher silanes, diborane, plasma, air, borazene, carbon monoxide, alcohols, and combinations thereof.

49. The method of claim 41 wherein the metal-containing layer has a thickness of about 1 angstrom to about 500 angstroms.

50. The method of claim 41 wherein the temperature of the semiconductor substrate or substrate assembly is about 25°

C. to about 400°

C.

51. The method of claim 41 wherein the deposition chamber containing the semiconductor substrate or substrate assembly has a pressure of about 10⁻

6 torr to about 10 torr.

52. The method of claim 41 further comprising purging excess vapor comprising the at least one precursor compound of Formula I from the deposition chamber after chemisorption of the compound onto the semiconductor substrate or substrate assembly.

53. The method of claim 52 wherein purging comprises purging with an inert gas.

54. The method of claim 53 wherein the inert gas is selected from the group consisting of nitrogen, helium, argon, and combinations thereof.

55. A method of manufacturing a memory device structure, the method comprising:

providing a substrate having a first electrode thereon,

providing at least one precursor compound of the formula (Formula I);

wherein;

M is selected from the group consisting of a Group 2 to Group 15 metal, a lanthanide, an actinide, and combinations thereof;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

each R¹, R², and R³ is independently an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1;

vaporizing the at least one precursor compound of Formula I;

contacting the at least one vaporized precursor compound of Formula I with the substrate to chemisorb the compound on the first electrode of the substrate;

providing at least one reaction gas;

contacting the at least one reaction gas with the substrate with the chemisorbed compound thereon to form a dielectric layer on the first electrode of the substrate; and

forming a second electrode on the dielectric layer.

56. A vapor deposition apparatus comprising:

a deposition chamber having a substrate positioned therein; and

at least one vessel comprising at least one precursor compound of the formula (Formula I);

wherein;

M is selected from the group consisting of a Group 2 to Group 15 metal, a lanthanide, an actinide, and combinations thereof;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

each R¹, R², and R³ is independently an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1.

57. The apparatus of claim 56 further comprising at least one source of at least one reaction gas.

58. The apparatus of claim 56 further comprising at least one source of an inert gas.

59. A precursor composition for use in a vapor deposition process comprising at least one compound of the formula (Formula I):

wherein;

M is selected from the group consisting of a Group 2 to Group 15 metal, a lanthanide, an actinide, and combinations thereof,

E is OR³;

each R¹, R², and R³ is independently an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1.

60. The precursor composition of claim 59 wherein the organic group is selected from the group consisting of an alkyl group, an aliphatic group, a cyclic group, and combinations thereof.

61. The precursor composition of claim 59 wherein L is selected from the group consisting of halides, amides, alkoxides, amidoxylates, amidinates, amidates, carboxylates, beta-diketonates, beta-imineketones, beta-diketiminates, carbonylates, ketiminates, and combinations thereof.

62. A precursor composition for use in a vapor deposition process comprising at least one compound of the formula (Formula I):

wherein;

M is lanthanum;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

each R¹, R², and R³ is independently an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1.

63. The precursor composition of claim 62 wherein the organic group is selected from the group consisting of an alkyl group, an aliphatic group, a cyclic group, and combinations thereof.

64. The precursor composition of claim 62 wherein L is selected from the group consisting of halides, amides, alkoxides, amidoxylates, amidinates, amidates, carboxylates, beta-diketonates, beta-imineketones, beta-diketiminates, carbonylates, ketiminates, and combinations thereof.

65. A precursor composition for use in a vapor deposition process comprising at least one compound of the formula (Formula I):

wherein;

M is hafnium;

E is XR³ or YR³R⁴, wherein X is O, S, or Se, and Y is N or P;

R¹ and R² are isopropyl groups;

R³ is an organic group;

R⁴ is hydrogen or an organic group;

L is an anionic supporting ligand;

n is the oxidation state of M; and

x is 0 to n-1.

66. The precursor composition of claim 65 wherein the organic group is selected from the group consisting of an alkyl group, an aliphatic group, a cyclic group, and combinations thereof.

67. The precursor composition of claim 65 wherein L is selected from the group consisting of halides, amides, alkoxides, amidoxylates, amidinates, amidates, carboxylates, beta-diketonates, beta-imineketones, beta-diketiminates, carbonylates, ketiminates, and combinations thereof.