Method and apparatus for detecting endpoint
First Claim
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1. A method for detecting an endpoint of a process in a plasma processing system comprising:
- starting said process;
measuring at least one endpoint signal;
generating at least one filtered endpoint signal by applying a Savitsky Golay filter to said at least one endpoint signal; and
determining an endpoint of said process from said at least one filtered endpoint signal.
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Abstract
The present invention presents a method for detecting an endpoint of an etch process for etching a substrate in plasma processing system (1) comprising: etching the substrate; measuring at least one endpoint signal; generating at least one filtered endpoint signal by filtering the at least one endpoint signal, wherein the filtering comprises applying a Savitsky Golay filter (12) to the at least one endpoint signal; and determining (14) an endpoint of the etch process from the at least one filtered endpoint signal.
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Citations
30 Claims
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1. A method for detecting an endpoint of a process in a plasma processing system comprising:
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starting said process;
measuring at least one endpoint signal;
generating at least one filtered endpoint signal by applying a Savitsky Golay filter to said at least one endpoint signal; and
determining an endpoint of said process from said at least one filtered endpoint signal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for detecting an endpoint of a process comprising:
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starting said process;
measuring a first endpoint signal;
measuring a second endpoint signal;
determining a ratio signal from a ratio of said first endpoint signal and said second endpoint signal, said ratio signal comprises an endpoint transition;
determining a differential signal from said ratio signal by applying a differential filter to said ratio signal, wherein said differential filter comprises a Savitsky Golay filter; and
determining an endpoint of said process from said differential signal. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21)
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22. A plasma processing system comprising:
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a process chamber;
a diagnostic system coupled to said process chamber and configured to measure at least one endpoint signal; and
a controller coupled to said diagnostic system, configured to filter said at least one endpoint signal using a Savitsky Golay filter, and configured to determine an endpoint from the filtered endpoint signal. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30)
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Specification