Field emission display

• US 20060038768A1
• Filed: 10/25/2005
• Published: 02/23/2006
• Est. Priority Date: 07/25/2002
• Status: Abandoned Application

• Current Assignee: Masakazu Sagawa, Mutsumi Suzuki, Toshiaki Kusunoki
• Original Assignee: Masakazu Sagawa, Mutsumi Suzuki, Toshiaki Kusunoki
• Inventors: Kusunoki, Toshiaki, Sagawa, Masakazu, Suzuki, Mutsumi
• Application Number:
  US11/256,955
• Publication Number:
  US 20060038768A1
• Time in Patent Office: Days
• US Class Current: 345/100
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G09G 3/22 using controlled light sources
• CPC Class Codes: H01J 1/312 having an electric field perpendicular to the surface, e.g. tunnel-effect cathodes of metal-insulator-metal [MIM] type H01J1/304- H01J1/308 take precedence
• CPC Class Codes: H01J 2201/3125 Metal-insulator-Metal [MIM] emission type cathodes
• CPC Class Codes: H01J 9/022 of cold cathodes
• CPC Class Codes: H01J 9/241 the vessel being for a flat panel display H01J9/261 takes precedence; flat discharge lamps H01J9/248

Abstract

A display having hot electron type electron sources displaying an image by a line sequential scanning scheme is provided to prevent poor brightness uniformity along scan lines. The hot electron type electron source is provided with a top electrode bus line serving as a scan line and a bottom electrode bus line serving as a data line. The top electrode bus line has a sheet resistance lower than that of the bottom electrode. The wire sheet resistance of the scam line can be reduced to several m/square. When forming a 40 inch large screen FED using the hot electron type electron sources, a voltage drop amount produced in the scan line can be suppressed below an allowable range. As a result, high quality image without poor brightness uniformity can be obtained.

Claims

1. A method of forming a display comprising:

forming a plurality of electron sources arranged in a matrix form, each of said electron sources being provided with at least one scan line and at least one data line, wherein the plurality of data lines are arranged in a first direction, to apply a first driving voltage to the plurality of electron sources, and wherein the plurality of scan lines are arranged in a second direction crossing the first direction, to apply a second driving voltage to the plurality of electron sources, wherein the data lines and scan lines are formed on a first substrate;

forming a second substrate, having phosphor layers;

coupling the second substrate to the first substrate by a frame; and

evacuating a space surrounded by the first substrate, the frame, and the second substrate;

wherein the plurality of scan lines are placed closer to the second substrate than the plurality of data lines are;

wherein an electron emission region of each of the plurality of electron sources has a first layer adjacent to the space;

wherein each of the plurality of scan lines comprises a second layer, a thickness of the second layer being thicker than a thickness of the data lines;

wherein the first layer is formed to cover a part of a third layer and the second layer covers another part of the third layer so that the third layer connects the first layer and the second layer,

wherein the third layer is thicker than the first layer;

wherein the second layer is thicker than third layer; and

wherein the scan lines are driven by line sequential scanning.

2. A method according to claim 1,

wherein a sheet resistance of the plurality of the scan lines is smaller than a sheet resistance of the plurality of the data lines.

3. A method according to claim 1,

wherein the first layer is formed above the plurality of data lines.

4. A method according to claim 1,

wherein the plurality of electron sources are either surface conduction type electron sources or MIM type electron sources.

5. A method according to claim 1,

wherein the plurality of data lines are formed on a surface of the first substrate;

and

wherein the first substrate is an insulating substrate.

6. A method according to claim 1,

wherein the plurality of scan lines are formed above the data lines.

13. A method according to claim 1, wherein the scan lines are formed by printing.

14. A method according to claim 1, wherein the third layer is comprised of a noble metal.

15. A method according to claim 1, wherein the third layer is comprised of a high melting point

7. A method of forming a display comprising:

forming a plurality of electron sources arranged in a matrix form, each of said electron sources being provided with at least one scan line and at least one data line, wherein the plurality of data lines are arranged in a first direction, to apply a first voltage to the plurality of electron sources, wherein the plurality of scan lines are arranged in a second direction intersecting the first direction, to apply a second voltage to the electron sources, and wherein the data lines and scan lines are formed on a first substrate;

forming a second substrate, having phosphor layers;

coupling said second substrate to the first substrate by a frame; and

evacuating a space surrounded by the first substrate, the frame, and the second substrate;

wherein the plurality of scan lines are placed closer to the second substrate than the data lines are;

wherein an electron emission region of the electron sources comprises a first layer adjacent to the space;

wherein the plurality of scan lines are each comprised of a second layer thicker than the data line, and a third layer arranged closer to the first substrate than the second layer is;

wherein the third layer is thicker than the first layer;

wherein the second layer is thicker than third layer;

wherein the third layer is arranged to be projected from the second layer;

wherein the first layer covers a part of the projected area of the third layer; and

wherein the scan lines are driven by line sequential scanning.

8. A method according to claim 7,

wherein a sheet resistance of the scan lines is smaller than a sheet resistance of the data lines.

9. A method according to claim 7,

wherein the first layer is formed above the data lines.

10. A method according to claim 7,

wherein the plurality of the data lines are formed on a surface of the first substrate;

and

wherein the first substrate is an insulating substrate.

11. A method according to claim 7,

wherein the plurality of the scan lines are formed above the data lines.

12. A method according to claim 7,

wherein the electron sources are either surface conduction type electron sources or MIM type electron sources.

16. A method according to claim 7, wherein the plurality of the scan lines are formed above the data lines.

17. A method according to claim 7, wherein the plurality of the scan lines are formed above the data lines.

18. A method according to claim 7, wherein the scan lines are formed by printing.