Semiconductor device and fabrication method of the same
First Claim
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1. A semiconductor device comprising:
- a semiconductor layer including a terminate end part and a cell formation part as surrounded by this end part; and
a plurality of guard rings each being formed at the end part to surround said cell formation part and being arranged to become shallower and smaller in width as getting near to a guard ring placed outside.
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Abstract
A semiconductor device comprises a semiconductor layer which includes a terminate end part and a cell formation part that is surrounded by this end part, and a plurality of guard rings each of which is formed at the end part to surround the cell formation part. These guard rings are made shallower and smaller in width as they get near to the guard ring that resides at the outside position.
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Citations
20 Claims
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1. A semiconductor device comprising:
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a semiconductor layer including a terminate end part and a cell formation part as surrounded by this end part; and
a plurality of guard rings each being formed at the end part to surround said cell formation part and being arranged to become shallower and smaller in width as getting near to a guard ring placed outside. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A semiconductor device comprising:
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a semiconductor layer including a terminate end part and a cell formation part as surrounded by this end part; and
a plurality of guard rings each being formed at the end part to surround said cell formation part and being arranged to become shallower and larger in interval between neighboring ones thereof as getting near to a guard ring placed outside. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A method for fabricating a semiconductor device comprising:
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forming a to-be-processed film to be processed into a mask on a surface of a semiconductor layer including a terminate end part and a cell formation part as surrounded by this end part;
forming at a portion of said to-be-processed film corresponding to said end part a plurality of openings surrounding a portion of said to-be-processed film corresponding to said cell formation part and being made smaller in width as getting near to an opening placed outside;
selectively etching said semiconductor layer while letting said to-be-processed film with said plurality of openings formed therein be as a mask to thereby form in said end part a plurality of trenches being made shallower and smaller in width as getting near to a trench placed outside; and
burying an epitaxial growth layer in said plurality of trenches to thereby form in said end part a plurality of guard rings. - View Dependent Claims (17, 18, 19, 20)
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Specification