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ISFETs fabrication method

  • US 20060046375A1
  • Filed: 12/07/2004
  • Published: 03/02/2006
  • Est. Priority Date: 08/30/2004
  • Status: Active Grant
First Claim
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1. A fabrication method for ion sensitive field effect transistors (ISFETs) with a SnO2 extended gate, comprising:

  • providing a substrate;

    forming a SnO2 detection film on the substrate by sol-gel technology to serve as an extended gate;

    electrically connecting the SnO2 detection film with a conductive wire;

    forming an insulating layer on the surface of the ISFET but exposing part of the SnO2 detection film and part of the conductive wire; and

    electrically connecting the exposed conductive wire and a gate terminal of a MOS transistor.

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