Lithographic apparatus and device manufacturing method

• US 20060049698A1
• Filed: 09/09/2004
• Published: 03/09/2006
• Est. Priority Date: 09/09/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Gilissen, Noud Jan, Buis, Edwin Johan, Cox, Henrikus Herman Marie, Schoot, Harmen Klaas Van Der, Maria Zaal, Koen Jacobus Johannes
• Granted Patent: US 7,492,440 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

Claims

1. A lithographic apparatus comprising:

an illumination system configured to condition a radiation beam;

a pattern support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate support constructed to hold a substrate;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

an actuator assembly configured to move one of said supports with respect to a base structure, the actuator assembly comprising;

an actuator assembly frame;

a flexible coupling assembly configured to flexibly couple said actuator assembly frame to said one support, and

at least one actuator coupling said actuator assembly frame to said base structure, the at least one actuator being configured to move said one support in three degrees of freedom in a plane and at least one other degree of freedom.

2. The lithographic apparatus according to claim 1, wherein said actuator assembly comprises at least one planar actuator configured to move said one support in said plane and at least one actuator configured to move said support in said one other degree of freedom.

3. The lithographic apparatus according to claim 2, wherein said one other degree of freedom is directed substantially perpendicular to said plane.

4. The lithographic apparatus according to claim 1, wherein the actuator assembly is at least partly provided with a heat shield configured to prevent a heat transfer to said support.

5. The lithographic apparatus according to claim 1, wherein the actuator assembly further comprises a cooling system.

6. The lithographic apparatus according to claim 1, wherein said one support is the pattern support.

7. The lithographic apparatus according to claim 1, wherein said one support is the substrate support.

8. The lithographic apparatus according to claim 1, further comprising an actuator assembly configured to move the other of said supports so that both said pattern support and said substrate support are moved by a respective actuator assembly that each comprise an actuator assembly frame, a flexible coupling assembly and at least one actuator.

9. The lithographic apparatus according to claim 1, wherein the pattern support is a mask table.

10. The lithographic apparatus according to claim 1, wherein the substrate support is a substrate table.

11. The lithographic apparatus according to claim 1, wherein said flexible coupling assembly comprises a plurality of leaf springs.

12. The lithographic apparatus according to claim 1, wherein said flexible coupling assembly comprises a plurality of flexible coupling members.

13. The lithographic apparatus according to claim 12, wherein the flexible coupling members are equidistant to one another.

14. The lithographic apparatus according to claim 1, wherein said at least one actuator includes a magnet assembly arranged in said actuator assembly frame and a coil arranged in said base structure.

15. The lithographic apparatus according to claim 1, wherein the actuator assembly is configured to filter supporting forces that act to space apart said support from the base structure.

22. A device manufacturing method according to claim 15, wherein said actuator assembly is configured to position said slide member over said running surface is six degrees of freedom.

16. An apparatus comprising an actuator assembly constructed to support and move an object, the actuator assembly comprising:

an actuator assembly frame;

a flexible coupling assembly configured to flexibly couple said actuator assembly frame to said object, and

at least one actuator coupling said actuator assembly frame to a base structure, the at least one actuator being configured to move said object in three degrees of freedom in a plane and at least one other degree of freedom.

17. The apparatus according to claim 16, wherein said flexible coupling assembly comprises a plurality of leaf springs.

18. The apparatus according to claim 16, wherein said flexible coupling assembly comprises a plurality of flexible coupling members.

19. The apparatus according to claim 18, wherein the flexible coupling members are equidistant to one another.

20. The lithographic apparatus according to claim 16, wherein said at least one actuator includes a magnet assembly arranged in said actuator assembly frame and a coil arranged in said base structure.

21. A device manufacturing method comprising:

patterning a beam of radiation with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of a substrate; and

supporting a slide member over a running surface of a base, the supporting comprising;

flexibly coupling an actuator assembly to the slide member; and

exerting a supporting force from said actuator assembly onto said running surface;

wherein said actuator assembly is configured to filter supporting forces that act to space apart said slide member from said running surface.