Polarizer for high-power deep UV radiation

• US 20060050370A1
• Filed: 09/07/2004
• Published: 03/09/2006
• Est. Priority Date: 09/07/2004
• Status: Active Grant

• Current Assignee: Corning Incorporated
• Original Assignee: Corning Incorporated
• Inventors: Maier, Robert L., Goodman, Douglas S.
• Granted Patent: US 7,119,951 B2
• Time in Patent Office: Days
• US Class Current: 359/352
• CPC Class Codes: G02B 5/3041 comprising multiple thin layers, e.g. multilayer stacks
• CPC Class Codes: G02B 5/3075 for use in the UV G02B5/3066 takes precedence

Abstract

A polarizing effect is achieved for light having wavelengths less than 250 nm by orienting an antireflector at an incidence angle between 65° and 75°. Despite limited choices for materials, the antireflector is constructed of layers that alternate in refractive index to exploit the mechanism of interference for limiting the reflectivity of one linear polarization component of the light. The same combination of layers supports the reflectivity of an orthogonal linear polarization component. The light reflected from the antireflector is highly polarized.

Claims

1. A polarizing system for deep UV light comprising:

a substrate having a surface normal inclined between 65° and

75°

to a direction of propagation of an unpolarized beam of light having a nominal wavelengths less than 250 nm;

an antireflective coating on the surface of the substrate that reflects no more than 2% of a first of two orthogonally related polarization components of the unpolarized beam of light;

the antireflective coating also reflects at least 80% of a second of the two orthogonally related polarization components of the unpolarized beam of light; and

an optical beam conveyor that routes a first portion of the unpolarized beam that is reflected from the antireflective coating as a substantially polarized beam intended for further propagation.

2. The polarizing system of claim 1 further comprising a beam disposer for abandoning a second portion of the unpolarized beam that is transmitted through the antireflective coating.

3. The polarizing system of claim 2 in which the substrate has first and second surfaces and the antireflective coating is on the first surface of the substrate and the beam disposer includes a diffusion pattern on the second surface of the substrate.

4. The polarizing system of claim 1 in which the antireflective coating includes a stack of layers that alternately vary in refractive index.

5. The polarizing system of claim 4 in which the stack of layers includes an innermost and an outermost layer, the innermost layer being adjacent to the substrate and the outermost layer having a refractive index that is higher than a refractive index of an adjacent layer of the stack of layers.

6. The polarizing system of claim 4 in which the layers have nominal thicknesses corresponding to optical path length differences between the layers equal to an integer multiple of one-quarter of the nominal wavelength of the unpolarized beam.

7. The polarizing system of claim 4 in which the stack includes less than 20 layers.

8. The polarizing system of claim 7 in which the stack includes at least 7 layers.

9. The polarizing system of claim 4 in which a refractive index difference between the alternating layers is at least 0.2 and no greater than 0.6.

10. The polarizing system of claim 4 in which the alternately varying layers are made from different fluoride materials.

11. The polarizing system of claim 5 in which the substrate is made of fused silica to provide thermal stability.

12. The polarizing system of claim 1 in which the antireflective coating exhibits a polarization extinction ratio between the reflected polarization components of at least 100 to 1.

13. The polarizing system of claim 1 in which the antireflective coating on the surface of the substrate provides for reflecting no more than 0.5% of the first orthogonally related polarization component of the unpolarized beam of light.

14. The polarizing system of claim 13 which the antireflective coating on the surface of the substrate provides for reflecting at least 85% of the second orthogonally related polarization component of the unpolarized beam of light.

15. The polarizing system of claim 1 in which the antireflective coating on the surface of the substrate provides for reflecting no more than 0.1% of the first orthogonally related polarization component of the unpolarized beam of light.

16. The polarizing system of claim 15 in which the antireflective coating on the surface of the substrate provides for reflecting approximately 90% of the second orthogonally related polarization component of the unpolarized beam of light.

17. The polarizing system of claim 1 in which the surface is inclined between 68°

and 73°

to a direction of propagation of the unpolarized beam of light.

18. The polarizing system of claim 1 in which the optical beam conveyor includes at least one reflective surface for further propagating the substantially polarized beam.

19. The polarizing system of claim 18 in which the optical beam conveyor includes a plurality of reflective surfaces for further propagating the substantially polarized beam coaxial with the propagating direction of the unpolarized beam.

20. The polarizing system of claim 18 in which the at least one reflective surface includes an antireflective coating that reflects no more than 2% of the first of two orthogonally related polarization components and that reflects at least 80% of the second of the two orthogonally related polarization components of the substantially polarized beam of light for further extinguishing the first of the two orthogonally related polarization components of the substantially polarized beam.

21. The polarizing system of claim 1 in which the unpolarized beam of light has a power densities of five milli-joules per square centimeter per pulse.

22. A polarization-sensitive routing system for ultraviolet light comprising:

a working optical pathway for conveying an unpolarized beam of ultraviolet light having a wavelength less than 250 nm;

an antireflector inclined to the working optical pathway such that rays within the unpolarized beam of ultraviolet light encounter the antireflector at angles of incidence above Brewster'"'"'s angle;

the antireflector including a plurality of layers that exploit a mechanism of interference for reducing reflectivity of P polarization components of the unpolarized beam that are oriented within the planes of incidence while substantially reflecting S polarization components of the unpolarized beam that are oriented normal to the planes of incidence; and

a beam conveyer that routes a first portion of the unpolarized beam that is reflected from the antireflector as a substantially S polarized beam at an extinction ratio of S polarization to P polarization of at least 40 to 1 along the working optical pathway for productive use.

23. The routing system of claim 22 in which the antireflector transmits a second portion of the unpolarized beam as a substantially P polarized beam at an extinction ratio of P polarization to S polarization of less than 40 to 1.

24. The routing system of claim 23 further comprising a beam disposer that abandons the substantially P polarized beam that is transmitted through the antireflector.

25. The routing system of claim 23 in which the beam conveyor is a first of two beam conveyors and a second of the conveyors routes the substantially P polarized beam for further intended propagation.

26. The routing system of claim 25 in which the antireflector is formed as an antireflective coating on a substrate and the substrate is made of calcium fluoride (CaF₂) for transmitting the substantially P polarized beam.

27. The routing system of claim 22 in which the layers of the antireflector have a thickness is approximately equal to a multiple of one-quarter wavelength of the unpolarized light measured in the direction of the incidence of the unpolarized light.

28. The routing system of claim 27 in which adjacent layers of the antireflector have refractive indices that differ by at least 0.2 and differ by no more than 0.6.

29. The routing system of claim 28 in which the antireflector includes between 5 and 20 layers.

30. The routing system of claim 22 in which the antireflector provides for reflecting less than 2% of the P polarization component of the unpolarized beam of light and for reflecting more than 80% of the S polarization component of the unpolarized beam of light.

31. The routing system of claim 22 in which the antireflector provides for reflecting less than 0.5% of the P polarization component of the unpolarized beam of light and for reflecting more than 85% of the S polarization component of the unpolarized beam of light.

32. The routing system of claim 22 in which the antireflector is inclined to the working optical pathway such that the rays within the unpolarized beam of ultraviolet light encounter the antireflector at angles of incidence between 65°

and 75°

.

33. The routing system of claim 22 in which the beam conveyer includes at least one reflective surface for directing the substantially S polarized beam along the working optical pathway.

34. The routing system of claim 33 in which the beam conveyor includes a plurality of reflective surfaces for further propagating the S polarized beam coaxial with a propagating direction of the unpolarized beam along the working optical pathway.

35. The routing system of claim 34 in which at least one of the reflective surfaces includes an antireflective coating for reducing reflectivity of the P polarization components of the substantially S polarized beam while substantially reflecting the S polarization components of the substantially S polarized beam.

36. A method of polarizing light having a nominal wavelength less than 250 nm and a power densities of at least five milli-joules per square centimeter per pulse comprising the steps of:

orienting an antireflective surface with respect to an unpolarized beam of light such that individual light rays of the beam impinge upon the antireflective surface at incidence angles between 65° and

75°

;

reflecting less than 2% of a first of two orthogonally related polarization components of the unpolarized beam of light from the antireflective surface;

reflecting more than 80% of a second of the two orthogonally related polarization components of the unpolarized beam of light from the antireflective surface; and

routing a first portion of the unpolarized beam that is reflected from the antireflective coating as a substantially polarized beam intended for further propagation.

37. The method of claim 36 comprising a further step of abandoning a second portion of the unpolarized beam that is transmitted through the antireflective coating.

38. The method of claim 36 comprising an additional step of routing a second portion of the unpolarized beam that is transmitted through the antireflective coating as a substantially orthogonally polarized beam for further propagation.

39. The method of claim 36 in which the step of orienting the antireflective surface includes orienting the antireflective surface with respect to the unpolarized beam of light such that the individual light rays of the beam impinge upon the antireflective surface at incidence angles between 68°

and 73°

.

40. The method of claim 36 in which the steps of selecting include reflecting less than 0.5% of the first orthogonally related polarization component and reflecting more than 85% of the second orthogonally related polarization component.

41. A method of polarizing ultraviolet light comprising:

conveying an unpolarized beam of ultraviolet light having a wavelength less than 250 nm along a working optical pathway;

inclining an antireflector to the working optical pathway such that rays within the unpolarized beam of ultraviolet light encounter the antireflector at angles of incidence above Brewster'"'"'s angle;

exploiting a mechanism of interference within the antireflector for reducing reflectivity of P polarization components of the unpolarized beam that are oriented within the planes of incidence while substantially reflecting S polarization components of the unpolarized beam that are oriented normal to the planes of incidence; and

routing a first portion of the unpolarized beam that is reflected from the antireflector as a substantially S polarized beam at an extinction ratio of S polarization to P polarization of at least 40 to 1 along the working optical pathway for productive use.

42. The method of claim 41 including an additional step of transmitting a second portion of the unpolarized beam as a substantially P polarized beam at an extinction ratio of P polarization to S polarization of less than 40 to 1.

43. The method of claim 42 including an additional step of abandoning the substantially P polarized beam that is transmitted through the antireflector.

44. The method of claim 42 including the additional step of routing the substantially P polarized beam for further intended propagation.

45. The method of claim 42 in which the step of exploiting includes reflecting less than 2% of the P polarization component of the unpolarized beam of light and reflecting more than 80% of the S polarization component of the unpolarized beam of light.

46. The method of claim 42 in which the step of exploiting includes reflecting less than 0.5% of the P polarization component of the unpolarized beam of light and reflecting more than 85% of the S polarization component of the unpolarized beam of light.

47. The method of claim 41 in which the step of inclining includes inclining the antireflector to the working optical pathway such that the rays within the unpolarized beam of ultraviolet light encounter the antireflector at angles of incidence between 65°

and 75°

.

48. The method of claim 41 in which the step of routing includes reflecting the substantially S polarized beam from a plurality of reflective surfaces for further propagating the substantially S polarized beam coaxial with a propagating direction of the unpolarized beam along the working optical pathway.

49. The method of claim 41 including an additional step of inclining another antireflector reflector to the working optical pathway such that rays within the substantially S polarized beam encounter the another antireflector at angles of incidence above Brewster'"'"'s angle.

50. The method of claim 49 including an additional step of exploiting a mechanism of interference within the another antireflector for reducing reflectivity of P polarization components of the substantially S polarized beam while substantially reflecting S polarization components of the substantially S polarized beam.

51. The method of claim 50 including an additional step of reflecting the substantially S polarized beam from the another antireflector at an extinction ratio of S polarization to P polarization of at least 1600 to 1 along the working optical pathway for productive use.

52. The method of claim 43 including an additional step of inclining a second antireflector to the working optical pathway such that rays within the transmitted second portion of the unpolarized beam encounter the second antireflector at angles of incidence above Brewster'"'"'s angle.

53. The method of claim 51 in which the transmitted second portion of the unpolarized beam is polarization rotated with respect to the second antireflector for reflecting S polarization components the second beam portion of the beam as a majority of the second beam portion.

54. A polarizer for polarizing deep UV light comprising:

a substrate having a mounting surface inclined to an optical axis along which the deep UV light is propagated,

a series of layers supported on the substrate having refractive indices that vary in an alternating pattern of higher and lower refractive indicies;

the layers being adjusted in thickness for optimizing conditions of interference between reflections of the deep UV light from adjacent layers;

a normal of the layers being inclined to an optical axis through an angle of incidence at which an extinction ratio between orthogonally related polarization components in a reflected beam approaches a maximum;

the angle of incidence being within a range at which the maximum extinction ratio occurs at progressively higher angles of incidence as the refractive index of the higher refractive index layers increases; and

the number of layers being within a range at which the maximum extinction ratio occurs at progressively higher angles of incidence as the number of layers increases.

55. The polarizer of claim 54 in which the high refractive index layers have a refractive index of between 1.65 and 1.8.

56. The polarizer of claim 55 in which the low refractive index layers have a refractive index between 1.35 and 1.5.

57. The polarizer of claim 54 in which he high and low refractive index layers have a refractive index difference of at least 0.2 and no greater than 0.6.

58. The polarizer of claim 54 in which the layers include an innermost layer and an outermost layer, the innermost layer being adjacent to the substrate and the outermost layer being among the layers having a higher refractive index.

59. The polarizer of claim 54 in which the layers are arranged to promote destructive interference between reflections of P polarized light having an electric field vector extending within a plane of incidence.

60. The polarizer of claim 59 in which the layers are arranged to promote constructive interference between reflections of S polarized light having an electric field vector extending normal to the plane of incidence.

61. The polarizer of claim 54 in which the maximum extinction ratio is at least 100 to 1.

62. The polarizer of claim 61 in which the maximum extinction ratio is at least 1000 to 1.

63. The polarizer of claim 54 in which the angle of incidence is between 65°

and 75°

.

64. The polarizer of claim 54 in which the number of layers is at least 7 and no greater than 20.

65. The polarizer of claim 64 in which the number of layers is at least 7 and no greater than 11.