Article coated with titanium compound film, process for producing the article and sputtering target for use in coating the film

• US 20060051597A1
• Filed: 06/17/2003
• Published: 03/09/2006
• Est. Priority Date: 06/17/2002
• Status: Abandoned Application

• Current Assignee: Nippon Sheet Glass Company Limited
• Original Assignee: Nippon Sheet Glass Company Limited
• Inventors: Anzaki, Toshiaki, Kijima, Yoshifumi, Inaoka, Daisuke
• Application Number:
  US10/518,601
• Publication Number:
  US 20060051597A1
• Time in Patent Office: Days
• US Class Current: 428/432
• CPC Class Codes: C03C 17/2456 Coating containing TiO2
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2217/24 Doped oxides
• CPC Class Codes: C03C 2218/155 by reactive sputtering
• CPC Class Codes: C23C 14/3414 Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• CPC Class Codes: Y10T 428/31678 Of metal

Abstract

The present invention provides a method for forming a titanium compound film on a substrate by a sputtering process by use of, in place of a conventional metallic titanium target, a titanium target containing a metal (such as tin or zinc) having two or more times higher sputtering yield in an argon atmosphere than titanium; an article coated with a titanium compound film; and a sputtering target for use in the film coating. The content of tin or zinc in the titanium target containing tin or zinc is preferably in the range of 1 to 45 at %, and further a third metal may be added. These can remove drawbacks in that the film has a low film formation rate and a high output power cannot be applied due to the occurrence of arcing in forming a titanium compound film on the surface of a substrate, such as plate-shaped glass, by a reactive sputtering process.

Claims

1. A method for producing an article coated with a titanium compound film characterized in that a titanium target containing 1 to less than or equal to 45 at % of a metal with two or more times higher sputtering yield than that of titanium in an argon atmosphere is used in forming the titanium compound film on a substrate by a reactive sputtering process.

2. The method for producing an article coated with a titanium compound film according to claim 1, wherein the titanium target contains 1 to 20 at % of the metal with two or more times higher sputtering yield than that of titanium in an argon atmosphere.

3. The method for producing an article coated with a titanium compound film according to claim 1, characterized in that the titanium target containing the metal contains a third metal other than titanium and the metal.

4. The method for producing an article coated with a titanium compound film according to claim 3, characterized in that the third metal comprises at least one of iron and molybdenum.

5. The method for producing an article coated with a titanium compound film according to claim 3, characterized in that the titanium target contains 0.01 to 10 at % of the third metal.

6. The method for producing an article coated with a titanium compound film according to claim 1, further comprising a step of conducting heat treatment during and/or after film formation of the titanium compound film.

7. The method for producing an article coated with a titanium compound film according to claim 1, characterized in that the titanium compound is a titanium oxide.

8. The method for producing an article coated with a titanium compound film according to claim 1, characterized in that the titanium compound is a titanium nitride.

9. The method for producing an article coated with a titanium compound film according to claim 1, characterized in that a substrate coated with the film is a plate-shaped glass.

10. The method for producing an article coated with a titanium compound film according to claim 1, characterized in that the metal is tin.

11. The method for producing an article coated with a titanium compound film according to claim 1, characterized in that the metal is zinc.

12. An article coated with a titanium compound film having a photocatalytic function or an optical function, produced by the method according to claim 1.

13. The article coated with a titanium compound film having a photocatalytic function according to claim 12, characterized in that a crystalline zirconium oxide layer, a zinc oxide layer, a magnesium oxide layer, a tin oxide layer, or an iron oxide layer is provided between the substrate and the titanium compound film.

14. An article coated with a titanium compound film containing a metal, wherein the metal has two or more times higher sputtering yield in an argon atmosphere than that of titanium and the metal content ratio of the metal to titanium is 1 to less than or equal to 45 at %.

15. The article coated with a titanium compound film according to claim 14, wherein the metal content ratio of the metal to titanium is 1 to 20 at %.

16. The article coated with a titanium compound film according to claim 14, wherein the metal is tin.

17. The article coated with a titanium compound film according to claim 14, wherein the metal is zinc.

18. The article coated with a titanium compound film according to claim 14, characterized in that the titanium compound is titanium oxide.

19. The article coated with a titanium compound film according to claim 14, characterized in that a substrate of the article is plate-shaped glass.

20. A titanium target containing a metal, which is used for forming a titanium compound film on a substrate by a reactive sputtering process, characterized in that the metal has two or more times higher sputtering yield in an argon atmosphere than titanium and the metal content ratio of the metal to titanium is 1 to less than or equal to 45 at %.

21. The titanium target containing a metal according to claim 20, wherein the metal content ratio of the metal to titanium is 1 to 20 at %.

22. The titanium target containing a metal according to claim 20, characterized in that a third metal other than the titanium and the metal is contained in the titanium target containing the metal.

23. The titanium target containing a metal according to claim 22, characterized in that the content of the third metal is 0.01 to 10 at %.

24. The titanium target containing a metal according to claim 22, characterized in that the third metal is at least one of iron and molybdenum.

25. The titanium target containing a metal according to claim 20, wherein the metal is tin.

26. The titanium target containing a metal according to claim 20, wherein the metal is zinc.