Plasma display filter with a dielectric/metallic layer stack of at least eleven layers

• US 20060055308A1
• Filed: 09/16/2004
• Published: 03/16/2006
• Est. Priority Date: 09/16/2004
• Status: Abandoned Application

• Current Assignee: Southwall Technologies, Inc. (Eastman Chemical Company)
• Original Assignee: Southwall Technologies, Inc. (Eastman Chemical Company)
• Inventors: Louie, Stanley, Schmidt, Chris R., Lairson, Bruce M., Gaderlund, Erik
• Application Number:
  US10/943,509
• Publication Number:
  US 20060055308A1
• Time in Patent Office: Days
• US Class Current: 313/489
• CPC Class Codes: G02B 5/284 of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates etalons for fibre optic multiplexing G02B6/29358; etalons for spectral measurement G01J3/26
• CPC Class Codes: G02B 5/285 comprising deposited thin solid films G02B5/281 - G02B5/289 take precedence; multilayered film filters for fibre optic multiplexing G02B6/29361
• CPC Class Codes: H01J 11/10 AC-PDPs with at least one main electrode being out of contact with the plasma
• CPC Class Codes: H01J 11/44 Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
• CPC Class Codes: H05K 9/0096 for television displays, e.g. plasma display panel

Abstract

A plasma display filter includes five metallic layers, such as silver alloy layers, having a combined thickness that exceeds 50 nm. The metallic layers form an alternating pattern with dielectric layers, where the layer in the pattern closest to a supporting substrate is the first of the dielectric layers. Layer thicknesses are selected to achieve a low reflected color shift with changes in the viewing angle, relatively neutral transmitted color properties, and desirable shielding characteristics with respect to infrared and electromagnetic radiation.

Claims

1. A plasma display filter comprising:

a substrate; and

a sequence of layers on said substrate, said sequence including at least six dielectric layers and at least five metallic layers, said dielectric and metallic layers being disposed in an alternating pattern in which one of said dielectric layers is the layer of said alternating pattern closest to said substrate;

wherein a combined thickness of said metallic layers in said alternating pattern is greater than 50 nm and wherein individual thicknesses of said metallic layers and said dielectric layers define filter properties that include;

(a) a reflected color Ra* of less than 20 throughout a range of 0 degrees to 60 degrees angle of incidence; and

(b) a sheet resistance in a range of 0.5 ohms/square and 1.5 ohms/square.

2. The plasma display filter of claim 1 further comprising a color correcting layer that exhibits a negative Ra* shift with increasing angle of incidence.

3. The plasma display filter of claim 1 wherein said metallic and dielectric layers further define a filter property (c) in which color travel Ra* is less than 10 CIE color units throughout said range of 0 to 60 degrees angle of incidence.

4. The plasma display filter of claim 1 wherein each metallic layer is a silver alloy layer having a thickness in the range of 6 nm to 18 nm.

5. The plasma display filter of claim 4 wherein at least one said silver alloy layer includes titanium.

6. The plasma display filter of claim 1 wherein said substrate is a flexible polymeric substrate.

7. The plasma display filter of claim 6 wherein said flexible polymeric substrate is PET.

8. The plasma display filter of claim 1 wherein said metallic layers are sputtered silver layers.

9. The plasma display filter of claim 1 wherein said filter property (b) is one in which said sheet resistance is less than 1.0 ohms/square.

10. A method of providing a filter for a plasma display comprising:

providing a transparent substrate having a flexibility which enables efficient lamination; and

forming a layer stack on said substrate so as to maintain a sheet resistance of less than 1.0 ohms/square and a reflected color Ra* of less than 20 throughout the range of 0 degrees to 60 degrees angle of incidence to said plasma display following said lamination of said substrate, said forming including providing layers which are ordered with respect to distance from said substrate so as to at least partially define said layer stack as including;

a first high refractive index layer having a thickness greater than 10 nm;

a first silver alloy layer having a thickness between 6 nm and 12 nm;

a second high refractive index layer having a thickness greater than 70 nm;

a second silver alloy layer having a thickness between 9 nm and 18 nm;

a third high refractive index layer having a thickness greater than 70 nm;

a third silver alloy layer having a thickness between 9 nm and 18 nm;

a fourth high refractive index layer having a thickness greater than 70 nm;

a fourth silver alloy layer having a thickness between 9 nm and 18 nm;

a fifth high refractive index layer having a thickness greater than 70 nm;

a fifth silver alloy layer having a thickness between 6 nm and 12 nm; and

a sixth high refractive index layer having a thickness greater than 10 nm.

11. The method of claim 10 wherein each of said first through sixth high refractive index layers exhibits a weighted average index of refraction between 1.8 and 2.5.

12. The method of claim 10 wherein each of said layers is sputter deposited.

13. The method of claim 10 further comprising forming a top protective layer on a side of said layer stack opposite to said substrate.

14. The method of claim 10 wherein forming each of said first through fifth silver alloy layers includes sputtering silver and depositing a titanium cap atop said silver.

15. The method of claim 14 wherein forming each of said first through fifth silver alloy layers includes subjecting said titanium cap to alloying and oxidation.

16. The method of claim 10 wherein providing said transparent substrate comprises providing a web of PET.

17. The method of claim 10 wherein forming said layer stack includes providing a color correcting layer that exhibits a negative-going Ra* shift with an increasing angle of incidence.

18. The method of claim 10 wherein forming said layer stack includes providing a combined thickness of said first through fifth silver alloy layers that exceeds 50 nm.