Exposure apparatus adapted to detect abnormal operating phenomenon

• US 20060055910A1
• Filed: 07/27/2005
• Published: 03/16/2006
• Est. Priority Date: 08/27/2004
• Status: Abandoned Application

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Lee, Jong-Haw
• Application Number:
  US11/190,013
• Publication Number:
  US 20060055910A1
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/2028 of an edge bead on wafers

Abstract

A wafer edge exposure apparatus and method of operation are disclosed. The apparatus includes an edge exposing device exposing an edge portion of a wafer loaded onto a rotatable support chuck under a body tube and an interlock generator generating an interlock signal stopping operation of the wafer edge exposure apparatus upon acoustically or optically detecting an abnormal phenomenon in relation to a wafer being processed and body tube.

Claims

1. A wafer edge exposure apparatus, comprising:

an edge exposing device adapted to expose an edge portion of a wafer loaded onto a rotatable support chuck under a body tube; and

,

an interlock generator adapted to detect phenomenon in relation to at least one of the wafer and body tube, and further adapted to generate an interlock signal stopping operation of the wafer edge exposure apparatus upon detecting an abnormal phenomenon.

2. The wafer edge exposure of claim 1, wherein the abnormal phenomenon comprises a scratch in the surface of the wafer.

3. The wafer edge exposure apparatus of claim 2, further comprising:

an equipment drive section adapted to drive the support wafer and responsive to the interlock signal to halt operation.

4. The wafer edge exposure of claim 3, wherein the interlock generator optically detects the scratch.

5. The wafer edge exposure of claim 4, wherein the interlock generator comprising:

a scratch measuring sensor adapted to detect the scratch and generate a corresponding image output signal;

a scratch comparator receiving the image output signal and generating a comparator output;

wherein the interlock generator is responsive to the comparator output.

6. The wafer edge exposure apparatus of claim 5, wherein the scratch comparator stores a reference image signal, and wherein the comparator output is generated by comparing the image output signal and the reference image signal.

7. The wafer edge exposure apparatus of claim 6, wherein the scratch measuring sensor comprises:

a light emitting section irradiating the wafer with light; and

a light receiving section receiving and detecting reflected light from the wafer; and

wherein the image output signal corresponds to the reflected light.

8. The wafer edge exposure apparatus of claim 5, wherein the scratch measuring sensor is positioned proximate the body tube or the edge portion of the wafer.

9. The wafer edge exposure of claim 1, wherein the abnormal phenomenon comprises friction noise related to contact between the wafer and body tube.

10. The wafer edge exposure apparatus of claim 9, further comprising:

an equipment drive section adapted to drive the support wafer and responsive to the interlock signal to halt operation.

11. The wafer edge exposure of claim 10, wherein the interlock generator acoustically detects the friction noise.

12. The wafer edge exposure of claim 11, wherein the interlock generator comprising:

a sound wave sensor adapted to detect the friction noise and generate a corresponding output signal;

a friction sound comparator receiving the output signal and generating a comparator output;

wherein the interlock generator is responsive to the comparator output.

13. The wafer edge exposure apparatus of claim 12, wherein the friction sound comparator stores a reference threshold, and wherein the comparator output is generated by comparing the output signal and the reference threshold.

14. The wafer edge exposure apparatus of claim 13, wherein the sound wave sensor is positioned proximate the body tube or the edge portion of the wafer.

15. A method for monitoring abnormal operating phenomenon in a wafer edge exposure apparatus, comprising:

detecting abnormal phenomenon associated with a wafer loaded onto a support chuck under a body tube; and

generating an interlock signal halting operation of the wafer edge exposure apparatus in response to a detected abnormal phenomenon.

16. The method according to claim 15, wherein the wafer edge exposure apparatus comprises an equipment drive section adapted to drive the support wafer;

and

wherein the method further comprises halting operation of the equipment drive section in responsive to the interlock signal.

17. The method according to claim 16, wherein the abnormal phenomenon relates to a friction noise associated with contact between the wafer and the abnormal phenomenon is detected acoustically.

18. The method according to claim 17, wherein acoustic detection of the abnormal phenomenon comprises:

detecting the friction noise using a sound wave sensor and generating a corresponding output signal;

receiving the output signal in a friction sound comparator, comparing the output signal to a reference threshold, and generating a comparator output;

wherein generation of the interlock signal is made in responsive to the comparator output.

19. The method according to claim 16, wherein the abnormal phenomenon is a scratch on a surface of the wafer and the abnormal phenomenon is detected optically.

20. The method of claim 19 wherein optical detection of the abnormal phenomenon comprises:

detecting a scratch on the wafer using a scratch measuring sensor and generating a corresponding output image signal;

receiving the output image signal in a scratch comparator, comparing the output image signal to a reference image signal, and generating a comparator output;

wherein generation of the interlock signal is made in responsive to the comparator output.