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Lithographic apparatus and device menufacturing method

  • US 20060060799A1
  • Filed: 11/01/2005
  • Published: 03/23/2006
  • Est. Priority Date: 07/11/2002
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus, comprising:

  • a radiation system configured to provide a beam of radiation;

    a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;

    a substrate table configured to hold a substrate;

    a projection system configured to project the patterned beam onto a target portion of the substrate;

    a base to which the support and the substrate table are mounted; and

    a reference frame compliantly mounted to the base, wherein the projection system comprises at least one optical element mounted on a projection frame that is compliantly mounted to the reference frame.

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