Lithographic apparatus and device menufacturing method
First Claim
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1. A lithographic projection apparatus, comprising:
- a radiation system configured to provide a beam of radiation;
a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a base to which the support and the substrate table are mounted; and
a reference frame compliantly mounted to the base, wherein the projection system comprises at least one optical element mounted on a projection frame that is compliantly mounted to the reference frame.
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Abstract
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
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Citations
21 Claims
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1. A lithographic projection apparatus, comprising:
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a radiation system configured to provide a beam of radiation;
a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a base to which the support and the substrate table are mounted; and
a reference frame compliantly mounted to the base, wherein the projection system comprises at least one optical element mounted on a projection frame that is compliantly mounted to the reference frame. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material using a projection system;
supporting a reference frame, a support configured to support a patterning device, and a substrate table configured to hold the substrate, on a base, wherein the reference frame is compliantly mounted to the base and the projection system is mounted to the reference frame; and
compliantly mounting the projection system to the reference frame while projecting the patterned beam of radiation onto the target portion. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A lithographic projection apparatus, comprising:
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a radiation system configured to provide a beam of radiation;
a support configured to support a patterning device, the patterning device configured to pattern the beam according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam onto a target portion of the substrate;
a base to which the support and the substrate table are mounted;
a reference frame mounted to the base, wherein the projection system comprises at least one optical element mounted on a projection frame that is mounted to the reference frame;
at least one first isolation mount operatively between the reference frame and the base to inhibit vibrations or movements of a predetermined type from being transmitted from the base to the reference frame; and
at least one second isolation mount operatively between the reference frame and the projection frame to inhibit vibrations or movements of a predetermined type from being transmitted from the reference frame to the projection frame.
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Specification