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Method and system for xenon fluoride etching with enhanced efficiency

  • US 20060065622A1
  • Filed: 03/17/2005
  • Published: 03/30/2006
  • Est. Priority Date: 09/27/2004
  • Status: Abandoned Application
First Claim
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1. An apparatus for etching comprising an etching chamber and a etchant module, wherein the etchant module is movable between a retracted position and an extended position, in the retracted position, the etchant module is substantially outside the etching chamber, and in the extended position the etchant module is substantially within the etching chamber.

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