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Method of forming a polishing pad having reduced striations

  • US 20060066001A1
  • Filed: 09/30/2004
  • Published: 03/30/2006
  • Est. Priority Date: 09/30/2004
  • Status: Active Grant
First Claim
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1. A method of forming a chemical mechanical polishing pad, comprising:

  • providing a tank with polymeric materials;

    providing a storage hopper with microspheres having an initial bulk density, wherein the storage hopper further comprises a porous membrane provided over a plenum;

    connecting a fluidizing gas source to the plenum through a gas inlet line;

    fluidizing the microspheres and reducing the initial bulk density by feeding gas into the plenum;

    providing a delivery system for delivering the polymeric materials and the microspheres to a mixer;

    forming a mixture of the polymeric materials and the microspheres;

    pouring the mixture into a mold to a form a molded product; and

    cutting the molded product into the polishing pad.

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