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Fabrication of channel wraparound gate structure for field-effect transistor

  • US 20060068591A1
  • Filed: 09/29/2005
  • Published: 03/30/2006
  • Est. Priority Date: 09/29/2004
  • Status: Active Grant
First Claim
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1. A method for fabricating a transistor comprising:

  • forming a dummy gate over a semiconductor body where the body is disposed on a first dielectric layer;

    forming source and drain regions in the body thereby defining a channel region in the body between the source and drain regions;

    forming a second dielectric layer over the first dielectric layer;

    removing the dummy gate;

    seeding the first dielectric layer under the channel region with ions which enhance the etching of the first dielectric layer;

    etching the first dielectric layer to define an opening under the channel region in the first dielectric layer; and

    forming a gate insulation and a conductive gate surrounding the channel region.

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