LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD UTILIZING TWO ARRAYS OF FOCUSING ELEMENTS
First Claim
1. A system, comprising:
- an illumination system that conditions a beam of radiation;
an array of individually controllable elements that pattern the beam;
a projection system that projects that pattered beam onto an image plane; and
first and second arrays of focusing elements, wherein each focusing element in the first array of focusing elements directs a portion of the beam onto a corresponding one of the individually controllable elements and directs a portion of the patterned beam onto a corresponding focusing element in the second array of focusing elements, which focuses the portion of the patterned beam onto a spot in the image plane.
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Accused Products
Abstract
A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate.
27 Citations
14 Claims
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1. A system, comprising:
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an illumination system that conditions a beam of radiation;
an array of individually controllable elements that pattern the beam;
a projection system that projects that pattered beam onto an image plane; and
first and second arrays of focusing elements, wherein each focusing element in the first array of focusing elements directs a portion of the beam onto a corresponding one of the individually controllable elements and directs a portion of the patterned beam onto a corresponding focusing element in the second array of focusing elements, which focuses the portion of the patterned beam onto a spot in the image plane. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method, comprising:
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patterning a beam of radiation using an array of individually controllable elements;
directing a portion of the beam onto corresponding ones of the individually controllable elements using respective focusing elements in a first array of focusing elements;
directing a portion of the pattered beam onto corresponding focusing elements in a second array of focusing elements using respective focusing elements in the first array of focusing elements; and
focusing the patterned radiation as corresponding focus spots in an image plane using respective focusing elements in the second array of focusing elements.
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Specification