Particle detection device, lithographic apparatus and device manufacturing method

• US 20060072108A1
• Filed: 10/04/2005
• Published: 04/06/2006
• Est. Priority Date: 10/05/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Franssen, Johannes Hendrikus Gertrudis, Onvlee, Johannes, Greve, Peter Ferdinand, Visser, Raimond, Verhagen, Erwin Theodorus Jacoba
• Granted Patent: US 7,283,225 B2
• Time in Patent Office: Days
• US Class Current: 356/239.800
• CPC Class Codes: G01N 21/94 Investigating contamination, e.g. dust G01N21/85 takes precedence
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.

Claims

1. A particle detection system configured to detect a particle on a surface of an object, the system comprising:

a first radiation source configured to generate a beam of radiation having a first wavelength, the beam of radiation being directed to a detection area at the surface of the object;

a radiation detector system configured to output a plurality of detector signals corresponding to an intensity of radiation received from the detection area incident on the radiation detector system; and

a detection circuit coupled to the radiation detector system and configured to determine from the plurality of detector signals whether a particle is present on the surface of the object,

wherein presence of a particle is determined by resolving a signal from a ghost particle relative to a signal from the particle.

2. The particle detection system of claim 1, wherein the detection circuit is configured to compare each of the plurality of detector signals with a predetermined threshold level, and to indicate that a particle is present on the surface of the object, when each of said plurality of detector signals has a level above said threshold level.

3. The particle detection system of claim 2, further comprising a cross-shaped diaphragm positioned between the surface of the object and the radiation detector system, wherein the radiation detector system comprises a detector device, said detector system being configured to output a first detector signal corresponding to the intensity of radiation incident on a first part of the detector system, and to output a second detector signal corresponding to the intensity of radiation incident on a second part of the detector system.

4. The particle detection system of claim 2, further comprising a second radiation source configured to generate a beam of radiation having a second wavelength, the beam of radiation being directed to the surface of the object, wherein the detector system comprises a first detector device configured to output a first detector signal corresponding to an intensity of radiation having the first wavelength and being incident on the first detector, and a second detector device configured to output a second detector signal corresponding to an intensity of radiation having the second wavelength and being incident on the second detector device.

5. The particle detection system of claim 2, wherein the detector system comprises (1) a first detector subsystem, the first detector subsystem being configured to output a first detector signal corresponding to the intensity of radiation incident on a first part of the first detector subsystem, and to output a second detector signal corresponding to the intensity of radiation incident on a second part of the first detector subsystem, and (2) a second detector subsystem, the second detector subsystem being configured to output a third detector signal corresponding to the intensity of radiation incident on a first part of the second detector subsystem, and to output a fourth detector signal corresponding to the intensity of radiation incident on a second part of the second detector subsystem;

and wherein the system further comprises a cross-shaped diaphragm positioned between the surface of the object and each detector.

6. The particle detection system of claim 2, wherein the detection circuit comprises a plurality of comparators configured to compare a corresponding plurality of input detector signals with a threshold level, each of the plurality of comparators outputting a logical comparator signal, and an AND-operator configured to receive each logical comparator signal and to output a logical TRUE signal when each of the plurality of input signals is greater than the threshold level.

7. The particle detection system of claim 2, wherein the detection circuit is further configured to determine a size of a detected particle based on the detector signal.

8. The particle detection system of claim 7, wherein the size of the detected particle is determined based on one detector signal or a combination of at least two detector signals.

9. The particle detection system of claim 7, wherein the radiation detector system comprises a detector device comprising an array of detector pixel elements, each detector signal of the plurality of detector signals corresponding to an intensity of radiation incident on at least one detector pixel element, thereby providing a particle image of a detected particle, the image comprising a number of image pixels, wherein the detection circuit is configured to

detect whether a detected particle is small or large based on the particle image;

determine the size of a small particle based on the radiation intensity incident on at least one detector pixel element; and

determine the size of a large particle based on image features of the particle image.

10. The particle detection system of claim 9, wherein the detection circuit is configured to detect that a particle is small if a total number of image pixels relating to the detected particle is smaller than a predetermined number of pixels.

11. The particle detection system of claim 4, wherein a size of the particle is determined based on the signal from the first detector, the signal from the second detector or a combination of the signals from the first and the second detector.

12. The particle detection system of claim 1, wherein the radiation detector system comprises

a radiation detector device for generating the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device;

and

a radiation blocking assembly for preventing radiation not originating from the detection area around the surface of the object from being incident on the predetermined part of the radiation detector device.

13. The particle detection system of claim 12, wherein the radiation blocking assembly comprises

a detector lens for focussing radiation originating from the detection area on the at least one predetermined part of the radiation detector device;

a blocking device for preventing radiation not originating from the detection area from being directed by the detector lens onto the predetermined part of the detector device.

14. The particle detection system of claim 12, wherein the radiation detector system is configured to further output at least a second detector signal for indicating whether radiation is incident on the radiation detector device outside said at least one predetermined part of the radiation detector device for detecting a ghost particle signal.

15. The particle detection system of claim 12, wherein the detection circuit is further configured to determine a size of a detected particle based on the detector signal.

16. The particle detection system of claim 15, wherein the detector system comprises a detector device comprising an array of detector pixel elements, each detector signal of the plurality of detector signals corresponding to an intensity of radiation incident on at least one of said detector pixel elements, the plurality of detector signals thereby providing a particle image of a detected particle, the image comprising a number of image pixels, wherein the detection circuit is configured to

detect whether a detected particle is small or large based on the particle image;

determine the size of a small particle based on the radiation intensity incident on at least one detector pixel element; and

determine the size of a large particle based on image features of the particle image.

17. The particle detection system of claim 16, wherein the detection circuit is configured to detect that a particle is small if a total number of image pixels relating to the detected particle is smaller than a predetermined number of pixels.

18. A lithographic apparatus comprising:

an illumination system configured to condition a beam of radiation;

a support structure configured to support a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate, and

a particle detection system configured to detect a particle in a detection area at a surface of an object, wherein presence of a particle is determined by spatially resolving a signal from a ghost particle from a signal from the particle.

19. The lithographic apparatus of claim 18, wherein said particle detection system comprises a detection circuit configured to compare a plurality of detector signals with a predetermined threshold level, and to indicate that a particle is present on the surface of the object, when said plurality of detector signals has a level above said threshold level.

20. The lithographic apparatus of claim 19, the particle detection system further comprising a cross-shaped diaphragm positioned between the surface of the object and the detector system, wherein the radiation detector system comprises a detector, said detector being configured to output a first detector signal corresponding to the intensity of radiation incident on a first part of the detector, and to output a second detector signal corresponding to the intensity of radiation incident on a second part of the detector.

21. The lithographic apparatus of claim 19, the particle detection system further comprising a second radiation source configured to generate a beam of radiation having a second wavelength, the beam of radiation being directed to the surface of the object, wherein the detector system comprises a first detector configured to output a first detector signal corresponding to an intensity of radiation having the first wavelength and being incident on the first detector, and a second detector configured to output a second detector signal corresponding to an intensity of radiation having the second wavelength and being incident on the second detector.

22. The lithographic apparatus of claim 19, wherein the detector system of the particle detection system comprises a first detector, the first detector being configured to output a first detector signal corresponding to the intensity of radiation incident on a first part of the first detector, and to output a second detector signal corresponding to the intensity of radiation incident on a second part of the first detector, and a second detector, the second detector being configured to output a third detector signal corresponding to the intensity of radiation incident on a first part of the second detector, and to output a fourth detector signal corresponding to the intensity of radiation incident on a second part of the second detector;

and wherein the system further comprises a cross-shaped diaphragm positioned between the surface of the object and each detector.

23. The lithographic apparatus of claim 19, wherein the detection circuit of the particle detection system comprises a plurality of comparators configured to compare a corresponding plurality of input detector signals with a threshold level, each of the plurality of comparators outputting a logical comparator signal, and an AND-operator configured to receive each logical comparator signal and to output a logical TRUE signal when each of the plurality of input signals is greater than the threshold level.

24. The lithographic apparatus of claim 18, wherein the detection circuit is further configured to determine a size of a detected particle based on the detector signal.

25. The lithographic apparatus of claim 24, wherein the size of the detected particle is determined based on one detector signal or a combination of at least two detector signals.

26. The lithographic apparatus of claim 24, wherein the detector system comprises a detector device comprising an array of detector pixel elements, each detector signal of the plurality of detector signals corresponding to an intensity of radiation incident on at least one detector pixel element, thereby providing a particle image of a detected particle, the image comprising a number of image pixels, wherein the detection circuit is configured to:

detect whether a detected particle is small or large based on the particle image;

determine the size of a small particle based on the radiation intensity incident on at least one detector pixel element; and

determine the size of a large particle based on image features of the particle image.

27. The lithographic apparatus of claim 26, wherein the detection circuit is configured to detect that a particle is small if a total number of image pixels relating to the detected particle is smaller than a predetermined number of pixels.

28. The lithographic apparatus of claim 21, wherein a size of the particle is determined based on the signal from the first detector, the signal from the second detector or a combination of the signals from the first and the second detector.

29. The lithographic apparatus of claim 18, wherein said object is the substrate or the patterning device.

30. The lithographic apparatus of claim 18, the particle detection system comprising:

a radiation detector device for generating a first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device; and

a radiation blocking assembly for preventing radiation not originating from the detection area around the surface of the object from being incident on the predetermined part of the radiation detector device.

31. The particle detection system of claim 30, wherein the radiation blocking assembly comprises

a detector lens for focussing radiation originating from the detection area on the at least one predetermined part of the radiation detector device;

a blocking device for preventing radiation not originating from the detection area from being directed by the detector lens onto the predetermined part of the detector device.

32. The particle detection system of claim 31, wherein the radiation detector system is configured to further output at least a second detector signal for indicating whether radiation is incident on the detector device outside said at least one predetermined part of the detector device for detecting a ghost particle signal.

33. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate, and

detecting a particle on a surface of an object with a particle detection system,

wherein said particle detection system comprises a detection circuit, which is configured to compare a plurality of detector signals with a predetermined threshold level, and to indicate that the particle is present on the surface of the object, when said plurality of detector signals has a level above said threshold level.

34. The device manufacturing method of claim 33, wherein said object is the substrate or a patterning device used to pattern the beam of radiation.

35. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate, and

detecting a particle on a surface of an object with a particle detection system,

wherein the particle detection system comprises

a radiation detector device for generating the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device; and

a radiation blocking assembly for preventing radiation not originating from a detection range around the surface of the object from being incident on the predetermined part of the detector device.

36. The device manufacturing method of claim 35 wherein said object is the substrate or a patterning device used to pattern the beam of radiation.

37. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate, and

detecting a particle on a surface of an object, said detecting including;

providing a beam of radiation onto the surface of said object,

detecting the beam of radiation redirected by said particle and/or said object;

outputting a plurality of signals corresponding to an intensity of the detected beam of radiation; and

comparing the plurality of signals with a predetermined threshold level to determine whether a particle is present on the surface of said object.

38. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate, and

detecting a particle on a surface of an object, said detecting including;

providing a beam of radiation onto the surface of said object,

detecting the beam of radiation redirected by said particle and/or said object;

directing a beam of radiation originating from within a detection range around the surface of the object on a predetermined part of a radiation detection device;

preventing radiation not originating from within a detection range around the surface of the object from being incident on the predetermined part of a radiation detection device; and

determining whether a particle is present on the surface of said object based on a detector signal corresponding to an intensity of the detected beam of radiation incident on the predetermined part of the radiation detection device.