Method and apparatus for polarizing electromagnetic radiation
First Claim
1. A method comprising:
- dividing electromagnetic radiation into first and second portions, substantially all of the first portion being linearly polarized in a first direction and substantially all of the second portion being linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction;
changing the linear polarization of at least one of the first and second portions such that substantially all of both of the first and second portions are linearly polarized in a third direction; and
redirecting at least one of the first and second portions such that substantially all of both the first and second portions are propagating in a fourth direction.
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Abstract
According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.
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Citations
29 Claims
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1. A method comprising:
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dividing electromagnetic radiation into first and second portions, substantially all of the first portion being linearly polarized in a first direction and substantially all of the second portion being linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction;
changing the linear polarization of at least one of the first and second portions such that substantially all of both of the first and second portions are linearly polarized in a third direction; and
redirecting at least one of the first and second portions such that substantially all of both the first and second portions are propagating in a fourth direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method comprising:
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directing a beam of electromagnetic radiation through a substantially uniform magnetic field, the beam having an axis, the electromagnetic radiation being substantially linearly polarized in a first direction, flux lines of the magnetic field extending in a second direction, the first direction being substantially orthogonal to the second direction, a first line extending from the axis of the beam and a first portion of the beam being substantially perpendicular to the first direction; and
propagating a second portion of the beam through a first material, within the magnetic field, having a first Verdet value, the second portion of the beam being linearly polarized in a third direction after said propagation, a second line extending from the axis of the beam and the second portion of the beam being substantially perpendicular to the third direction. - View Dependent Claims (12, 13, 14, 15, 16)
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17. A semiconductor processing apparatus comprising:
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a substrate support to support a semiconductor substrate;
an electromagnetic radiation source to emit electromagnetic radiation;
a polarization subsystem comprising;
a polarizing beam splitter to split the electromagnetic radiation into first and second portions, substantially all of the first portion being linearly polarized in a first direction and substantially all of the second portion being linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction;
at least one wave-plate to change the linear polarization of at least one of the first and second portions such that substantially all of both of the first and second portions are linearly polarized in a third direction; and
at least one reflective device to reflect at least one of the first and second portions such that substantially all of both the first and second portions are propagating in a fourth direction; and
a reticle positioned between the polarization subsystem and the substrate support, the first and second portions of the electromagnetic radiation to pass through the reticle onto the semiconductor substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25)
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26. A semiconductor substrate processing apparatus comprising:
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a substrate support to support a semiconductor substrate;
an electromagnetic radiation source to emit electromagnetic radiation;
a polarization subsystem comprising;
a polarizing beam splitter being radially symmetric about a central axis thereof to split the electromagnetic radiation into first and second portions, each of the first and second portions having a plurality of sections, the first portion propagating in a first direction substantially parallel to the central axis of the beam splitter, each respective section of the first portion being linearly polarized in an a direction parallel to a line extending between the central axis of the beam splitter and the respective section of the first portion, the second portion propagating radially from the central axis of the beam splitter, each respective section of the second portion being linearly polarized in a direction perpendicular to a line extending between the central axis of the beam splitter and the respective section of the second portion;
a wave-plate being radially symmetric about the central axis of the beam splitter to change the linear polarization of the first portion of the first portion such that each respective section of the first portion is linearly polarized in a direction perpendicular to the line extending between the central axis of the beam splitter and the respective section of the first portion; and
at least one reflective device to reflect the second portion from the beam splitter into substantially the first direction; and
a reticle positioned between the polarization subsystem and the substrate support, the first and second portions of the electromagnetic radiation to pass through the reticle and onto the semiconductor wafer. - View Dependent Claims (27, 28, 29)
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Specification