Method and system for providing MEMS device package with secondary seal

• US 20060076631A1
• Filed: 05/20/2005
• Published: 04/13/2006
• Est. Priority Date: 09/27/2004
• Status: Abandoned Application

• Current Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Inventors: Gally, Brian J., Palmateer, Lauren, Cummings, William J.
• Application Number:
  US11/134,838
• Publication Number:
  US 20060076631A1
• Time in Patent Office: Days
• US Class Current: 257/414
• CPC Class Codes: B81B 2201/047 Optical MEMS not provided for in B81B2201/042 - B81B2201/045
• CPC Class Codes: B81B 7/0041 maintaining a controlled atmosphere with techniques not provided for in B81B7/0038
• CPC Class Codes: B81C 2203/019 characterised by the material or arrangement of seals between parts
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26

Abstract

A MEMS device package comprises a substrate with a MEMS device formed thereon, a backplane, and a primary seal, wherein the primary seal is positioned between the backplane and the substrate to encapsulate and seal the MEMS device package from ambient conditions. The MEMS device package further comprises a secondary seal in contact with at least the backplane and the substrate.

Claims

1. A microelectromechanical system (MEMS) device, comprising:

a substrate;

a MEMS device formed on said substrate;

a backplane;

a primary seal positioned proximate a perimeter of the MEMS device and in contact with said substrate and said backplane; and

a secondary seal positioned proximate an outer periphery of said primary seal and in contact with said substrate and said backplane.

2. The MEMS device of claim 1, wherein said primary seal is one of a continuous and a non-continuous seal.

3. The MEMS device of claim 1, wherein said secondary seal is one of a continuous and non-continuous seal.

4. The MEMS device of claim 1, wherein said secondary seal comprises an anisotropic conductive film (ACF).

5. The MEMS device of claim 4, wherein the ACF comprises a tailored sealing portion proximate said outer periphery of said primary seal.

6. The MEMS device of claim 1, wherein said secondary seal is in contact with said primary seal.

7. The MEMS device of claim 1, wherein said secondary seal comprises a hydrophobic material.

8. The MEMS device of claim 1, wherein said secondary seal comprises one of an adhesive and a metal.

9. The MEMS device of claim 1, wherein said MEMS device comprises an interferometric modulator array.

10. The MEMS device of claim 1, wherein said device comprises a display system comprising:

a processor that is in electrical communication with said MEMS device, said processor being configured to process image data; and

a memory device in electrical communication with said processor.

11. The MEMS device as recited in claim 10, further comprising:

a first controller configured to send at least one signal to said MEMS device; and

a second controller configured to send at least a portion of said image data to said first controller.

12. The MEMS device as recited in claim 10, further comprising:

an image source module configured to send said image data to said processor.

13. The MEMS device as recited in claim 12, wherein said image source module comprises at least one of a receiver, transceiver, and transmitter.

14. The MEMS device as recited in claim 10, further comprising:

an input device configured to receive input data and to communicate said input data to said processor.

15. A method of sealing a microelectromechanical system (MEMS) device package, comprising:

providing a MEMS device package comprising a backplane and a substrate, wherein a MEMS device is formed on said substrate;

providing a primary seal formed proximate a perimeter of said MEMS device and between said backplane and said substrate; and

forming a secondary seal proximate an outer periphery of said primary seal and in contact with said substrate and said backplane.

16. The method of claim 15, wherein said primary seal is formed on at least one of said backplane and said substrate.

17. The method of claim 15, wherein forming said secondary seal comprises placing a solder preform proximate an outer periphery of said primary seal, and melting said solder preform to contact said substrate and said backplane.

18. The method of claim 17, wherein said placing occurs before said backplane, said primary seal, and said substrate are assembled, and wherein said melting occurs after said assembly.

19. The method of claim 15, wherein said secondary seal is formed in contact with said primary seal.

20. The method of claim 15, wherein said primary seal is one of a continuous and a non-continuous seal.

21. The method of claim 15, wherein said secondary seal comprises an anisotropic conductive film.

22. The method of claim 15, wherein said secondary seal comprises a hydrophobic material.

23. The method of claim 15, wherein said secondary seal comprises one of an adhesive and a metal.

24. The method of claim 15, wherein said MEMS device comprises an interferometric modulator array.

25. A system for sealing a microelectromechanical system (MEMS) device package, comprising:

a MEMS device package comprising a backplane and a substrate, wherein a MEMS device is formed on said substrate;

a primary seal formed proximate a perimeter of said MEMS device and between said backplane and said substrate; and

means for sealing an outer periphery of said primary seal, wherein said means is in contact with said substrate and said backplane.

26. The system of claim 25, wherein said means for sealing comprises a solder preform placed proximate an outer periphery of said primary seal, and means for melting said solder preform to contact said substrate and said backplane.

27. The system of claim 25, wherein said means for sealing is in contact with said primary seal.

28. The system of claim 25, wherein said primary seal is one of a continuous and a non-continuous seal.

29. The system of claim 25, wherein said means for sealing comprises an anisotropic conductive film.

30. The system of claim 25, wherein said means for sealing comprises a hydrophobic material.

31. The system of claim 25, wherein said means for sealing comprises one of an adhesive and a metal.

32. The system of claim 25, wherein said MEMS device comprises an interferometric modulator array.

33. A microelectromechanical system (MEMS) device package comprising a primary inner seal and a secondary outer seal, wherein said package is produced by a method comprising:

providing a MEMS device package comprising a backplane and a substrate, wherein a MEMS device is formed on said substrate;

providing a primary seal formed proximate a perimeter of said MEMS device and between said backplane and said substrate; and

forming a secondary seal proximate an outer periphery of said primary seal and in contact with said substrate and said backplane.

34. The MEMS device package of claim 33, wherein said primary seal is formed on at least one of said backplane and said substrate.

35. The MEMS device package of claim 33, wherein forming said secondary seal comprises placing a solder preform proximate an outer periphery of said primary seal, and melting said solder preform to contact said substrate and said backplane.

36. The MEMS device package of claim 35, wherein said placing occurs before said backplane, said primary seal, and said substrate are assembled, and wherein said melting occurs after said assembly.

37. The MEMS device package of claim 33, wherein said secondary seal is formed in contact with said primary seal.

38. The MEMS device package of claim 33, wherein said primary seal is one of a continuous and a non-continuous seal.

39. The MEMS device package of claim 33, wherein said secondary seal comprises an anisotropic conductive film.

40. The MEMS device package of claim 33, wherein said secondary seal comprises a hydrophobic material.

41. The MEMS device package of claim 33, wherein said secondary seal comprises one of an adhesive and a metal.

42. The MEMS device package of claim 33, wherein said MEMS device comprises an interferometric modulator array.

43. A microelectromechanical system (MEMS) device package, comprising:

a substrate;

a MEMS device formed on said substrate;

a backplane;

a seal positioned proximate a perimeter of said MEMS device and in contact with said substrate and said backplane;

a flexible circuit; and

an anisotropic conductive film in contact with said flexible circuit, said substrate, and said backplane.

44. The MEMS device package of claim 43, wherein said anisotropic conductive film is in contact with said seal.

45. The MEMS device package of claim 43, wherein said MEMS device comprises an interferometric modulator array.

46. The MEMS device package of claim 43, wherein said anisotropic conductive film comprises a tailored sealing portion proximate said seal.

47. A method of assembling a microelectromechanical system (MEMS) device package, comprising:

contacting a flexible circuit, an anisotropic conductive film, and a substrate, wherein said substrate comprises a MEMS device thereon, and a seal proximate a perimeter of said MEMS device and in contact with said substrate and a backplane; and

applying a force to said flexible circuit so as to force said anisotropic conductive film into contact with said backplane.

48. The method of claim 47, wherein said anisotropic conductive film is in contact with said seal.